SCHEMBL66309

SCHEMBL66309

CCO[Si](OCC)(OCC)C(C)OC(C)=O

nearest known ligand 0.42

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38
CHRM1 P11229 1/20 0.38
TBXA2R P21731 1/20 0.38
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
HSD17B10 Q99714 1/20 0.37
GALR3 O60755 1/20 0.36
MAPT P10636 1/20 0.36
BLM P54132 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TRPV1 Q8NER1 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3338084 0.85 TSHR (0.41) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL12814327 0.81 LMNA (0.39) TSHRCHRM2CHRM4CHRM1LMNA
SCHEMBL10608002 0.80 ALDH1A1 (0.45) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL1253678 0.80 TSHR (0.41) TSHRALDH1A1
SCHEMBL3519293 0.80 TSHR (0.39) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL10605213 0.79 ALDH1A1 (0.39) TSHRALDH1A1LMNA
SCHEMBL22660981 0.78 CYP1A2 (0.31)
SCHEMBL559259 0.77 TSHR (0.36) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL2476564 0.76 TSHR (0.41) TSHRALDH1A1HSD17B10SMN1; SMN2
SCHEMBL5487746 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109135426-B Temperature-induced color change anti-counterfeiting ink for industrial and commercial management supervision and preparation method thereof 淄博职业学院 2021-04-02 CN claimed
US-20190015815-A1 SUPERFICIALLY POROUS MATERIALS COMPRISING A COATED CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS WATERS TECHNOLOGIES CORPORATION 2019-01-17 US claimed
WO-2014114717-A1 METHOD FOR PREPARING A MGO/ORGANIC HYBRID MATERIAL, SAID MATERIAL AND THE USES THEREOF Commissariat à l'énergie atomique et aux énergies alternatives (FR) 2014-07-31 WO claimed
US-20140011993-A1 PROCESS FOR PREPARING SILICA PARTICLES CONTAINING A PHTHALOCYANINE DERIVATIVE BY MICROWAVE IRRADIATION, SAID PARTICLES AND USES THEREOF COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) 2014-01-09 US claimed
EP-2675809-A1 PROCESS FOR PREPARING SILICA PARTICLES CONTAINING A PHTHALOCYANINE DERIVATIVE BY MICROWAVE IRRADIATION, SAID PARTICLES AND USES THEREOF Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR) 2013-12-25 EP claimed
EP-2598440-A2 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS HYBRID CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
EP-2598441-A1 SUPERFICIALLY POROUS MATERIALS COMPRISING A SUBSTANTIALLY NONPOROUS CORE HAVING NARROW PARTICLE SIZE DISTRIBUTION; PROCESS FOR THE PREPARATION THEREOF; AND USE THEREOF FOR CHROMATOGRAPHIC SEPARATIONS Waters Technologies Corporation (US) 2013-06-05 EP claimed
EP-2534207-A1 STÖBER METHOD FOR PREPARING SILICA PARTICLES CONTAINING A PHTHALOCYANINE DERIVATIVE, SAID PARTICLES AND THE USES THEREOF Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR) 2012-12-19 EP claimed
US-20120308826-A1 STOBER METHOD FOR PREPARING SILICA PARTICLES CONTAINING A PHTHALOCYANINE DERIVATIVE, SAID PARTICLES AND THE USES THEREOF COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) 2012-12-06 US claimed
WO-2012110554-A1 PROCESS FOR PREPARING SILICA PARTICLES CONTAINING A PHTHALOCYANINE DERIVATIVE BY MICROWAVE IRRADIATION, SAID PARTICLES AND USES THEREOF Commissariat à l'énergie atomique et aux énergies alternatives (FR) 2012-08-23 WO claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-5331049-A Ethylene-unsaturated ester copolymer with grafted hydrolyzable silane functionality and tackifier blend EXXON CHEMICAL PATENTS INC. (US) 1994-07-19 US claimed
WO-1992000362-A2 WATER-CURABLE, HOT MELT ADHESIVE COMPOSITION EXXON CHEMICAL PATENTS INC. (US) 1992-01-09 WO claimed