SCHEMBL664500

SCHEMBL664500

C[C@@H](S)c1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL184638 1.00
SCHEMBL664987 1.00
Bromide SCHEMBL6735763 0.97 TAAR1 (0.44)
SCHEMBL28751595 0.87 TSHR (0.48)
SCHEMBL3174147 0.84 PTGS2 (0.54)
SCHEMBL332099 0.83 ESR1 (0.38)
SCHEMBL332300 0.79 HDAC4 (0.37)
SCHEMBL20216133 0.78 LTA4H (0.52)
SCHEMBL21524731 0.78 ALDH1A1 (0.46)
SCHEMBL1960097 0.77 TAAR1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020215267-A1 USE OF NTCP INHIBITORS IN PREVENTING AND TREATING HEPATOCARCINOGENESIS NATIONAL INSTITUTE OF BIOLOGICAL SCIENCES, BEIJING (CN) 2020-10-29 WO disclosed
US-9766547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
WO-2017027967-A1 INHIBITORS OF PEPTIDYL ARGININE DEIMINASE (PAD) ENZYMES AND USES THEREOF UNIVERSITY HEALTH NETWORK (CA) 2017-02-23 WO disclosed
US-20160280675-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2016-09-29 US disclosed
US-20160209746-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND FUJIFILM CORPORATION (JP) 2016-07-21 US disclosed
US-20160048075-A1 PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-02-18 US disclosed
US-20160011517-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-14 US disclosed
EP-2391600-B1 INTERMEDIATES IN THE ENANTIOSELECTIVE SYNTHESIS OF 3-(AMINOMETHYL)-5-METHYL-HEXANOIC ACID PROVOST FELLOWS & SCHOLARS COLLEGE OF THE HOLY UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN (IE) 2016-01-06 EP disclosed
US-9023576-B2 Positive resist composition for immersion exposure and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2015-05-05 US disclosed
WO-2015051043-A1 BIARYL ACYL-SULFONAMIDE COMPOUNDS AS SODIUM CHANNEL INHIBITORS AMGEN INC. (US) 2015-04-09 WO disclosed
EP-1091248-B1 Postive-working resist composition FUJIFILM CORP (JP) 2012-05-30 EP disclosed
US-20120058436-A1 PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-20120046468-A1 INTERMEDIATES IN THE ENANTIOSELECTIVE SYNTHESIS OF 3-(AMINOMETHYL)-5-METHYL-HEXANOIC ACID THE PROVOST,FELLOWS AND SCHOLARS OF THE COLLEGE OF THE HOLY LAND AND UNDIVIDED TRINITY OF QUEEN ELIZ (IE) 2012-02-23 US disclosed
EP-1988133-B1 Ink jet ink, ink jet recording method, ink cartridge, recording unit and ink jet recording apparatus CANON KK (JP) 2011-04-20 EP disclosed
EP-2213659-A1 Intermediates in the Enantioselective Synthesis of 3-(Aminomethyl)-5-Methyl-Hexanoic Acid The Provost, Fellows and Scholars of the College of the Holy and Undivided Trinity of Queen Elizabeth near Dublin (IE) 2010-08-04 EP disclosed
EP-1835342-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
US-20070105832-A1 Substituted azetidinones Cadrenal Therapeutics, Inc. 2007-05-10 US disclosed
EP-0083335-B1 OPTICALLY ACTIVE CHIRAL COMPOUNDS, PROCESS FOR THEIR PREPARATION AND USE OF THESE COMPOUNDS IN THE PROTECTION OF FUNCTIONAL -OH, -SH, -NH- GROUPS, IN THE SEPARATION OF RACEMATES, IN THE PREPARATION OF OPTICALLY ACTIVE IMIDOESTER HYDROCHLORIDES AND OF OPTICALLY ACTIVE ESTERS, IN THE PREPARATION OF OPTICALLY ENRICHED ALCOHOLS AND IN THE PREPARATION OF OPTICALLY ACTIVE COMPOUNDS BY ASYMMETRIC INDUCTION Noe, Christian, Dipl.-Ing. Dr. (AT) 1987-08-12 EP disclosed
US-4497960-A Chiral, optically active compounds useful as protective groups for hydroxy, thiol and amino compounds NOE CHRISTIAN (AT) 1985-02-05 US disclosed
EP-0083335-A1 Optically active chiral compounds, process for their preparation and use of these compounds in the protection of functional -OH, -SH, -NH- groups, in the separation of racemates, in the preparation of optically active imidoester hydrochlorides and of optically active esters, in the preparation of optically enriched alcohols and in the preparation of optically active compounds by asymmetric induction Noe, Christian, Dipl.-Ing. Dr. (AT) 1983-07-06 EP disclosed