SCHEMBL6682544

SCHEMBL6682544

CCC(CO)(CO)CO.O=C(O)CCC(=O)OCCO

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 1/20 0.39
ADRA2A P08913 1/20 0.37
ADRA1A P35348 1/20 0.37
EGLN1 Q9GZT9 2/20 0.36
MAPT P10636 1/20 0.36
BLM P54132 1/20 0.36
KDM6B O15054 1/20 0.36
KDM5C P41229 1/20 0.36
PHF8 Q9UPP1 1/20 0.36
KDM2A Q9Y2K7 1/20 0.36
DGKA P23743 1/20 0.35
LMNA P02545 3/20 0.34
HTR2C P28335 1/20 0.33
PAM P19021 2/20 0.33
ACHE P22303 1/20 0.32
FFAR3 O14843 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683877 0.83 LMNA (0.45) MGLLADRA2AADRA1AEGLN1MAPT
SCHEMBL542102 0.82 EGLN1 (0.38) ADRA2AADRA1AEGLN1MAPTBLM
Succinic Acid SCHEMBL28327661 0.82 TSHR (0.38) EGLN1MAPTKDM6BKDM5CPHF8
SCHEMBL1104248 0.82 THRB (0.46) ADRA2AADRA1AEGLN1MAPTBLM
SCHEMBL11669700 0.82 EPHX2 (0.45) MGLLMAPTDGKAPAMALDH1A1
SCHEMBL1104235 0.81 ADRA2A (0.36) ADRA2AADRA1AEGLN1MAPTBLM
Succinic Acid SCHEMBL6682541 0.81 LMNA (0.43) EGLN1LMNAFFAR3HDAC3HDAC1
SCHEMBL27548440 0.81 LMNA (0.43) MGLLADRA2AADRA1AEGLN1MAPT
SCHEMBL9391861 0.81 LMNA (0.43) MGLLADRA2AADRA1AEGLN1MAPT
Succinic Acid SCHEMBL28597264 0.81 LMNA (0.43) EGLN1LMNAFFAR3HDAC3HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0747416-B1 ALIPHATIC POLYESTER RESIN AND PROCESS FOR PRODUCING THE SAME SHOWA DENKO KK (JP) 2004-11-10 EP disclosed
US-5714569-A IMPROVED FORMABILITY, STABILITY, BIODEGRADATION SHOWA DENKO K.K. (JP) 1998-02-03 US disclosed
EP-0747416-A1 ALIPHATIC POLYESTER RESIN AND PROCESS FOR PRODUCING THE SAME SHOWA DENKO KABUSHIKI KAISHA (JP) 1996-12-11 EP disclosed