SCHEMBL6692573

SCHEMBL6692573

C=C(C)c1ccc(OC(C)(C)OC(C)(C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.34
PPARA Q07869 2/20 0.33
FABP2 P12104 1/20 0.33
PPARG P37231 1/20 0.33
SLC22A12 Q96S37 1/20 0.33
ELANE P08246 3/20 0.33
HPGD P15428 1/20 0.31
RAB9A P51151 1/20 0.31
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
KDM4E B2RXH2 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1711303 0.84 MAPT (0.38) MAPTPPARAFABP2PPARGSLC22A12
SCHEMBL6698198 0.83 MAPT (0.39) MAPTPPARAFABP2PPARGSLC22A12
SCHEMBL6689009 0.82 MAPT (0.33) MAPTPPARAFABP2PPARGSLC22A12
SCHEMBL6695240 0.80 ADORA3 (0.31) MAPTKMT2A
SCHEMBL6694114 0.80 ELANE (0.33) MAPTPPARAPPARGELANEHPGD
SCHEMBL6690485 0.79 PPARA (0.34) MAPTPPARAFABP2PPARGSLC22A12
SCHEMBL6695701 0.79 KMT2A (0.36) MAPTPPARAFABP2PPARGSLC22A12
SCHEMBL6689382 0.77 ELANE (0.37) ELANE
SCHEMBL6689043 0.76 L3MBTL1 (0.34) MAPTPPARGELANERAB9AKMT2A
SCHEMBL6690565 0.75 TSHR (0.36) MAPTRAB9ACYP1A2CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed