SCHEMBL6689009

SCHEMBL6689009

C=C(C)c1ccc(OC(C)(OC(C)(C)C)C(C)(C)C)cc1

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.33
FABP2 P12104 1/20 0.31
PPARG P37231 1/20 0.31
PPARA Q07869 1/20 0.31
SLC22A12 Q96S37 1/20 0.31
ELANE P08246 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6697868 0.84 MAPT (0.37) MAPTFABP2PPARGPPARASLC22A12
SCHEMBL6692573 0.82 MAPT (0.34) MAPTFABP2PPARGPPARASLC22A12
SCHEMBL1711303 0.81 MAPT (0.38) MAPTFABP2PPARGPPARASLC22A12
SCHEMBL6693752 0.80 KMT2A (0.35) MAPTPPARGPPARA
SCHEMBL6694535 0.80 ABCB11 (0.33) MAPTPPARA
SCHEMBL6689024 0.78 L3MBTL1 (0.33) MAPTPPARGELANE
SCHEMBL6695240 0.77 ADORA3 (0.31) MAPT
SCHEMBL6694114 0.77 ELANE (0.33) MAPTPPARGPPARAELANE
SCHEMBL6695737 0.76 GAA (0.35) MAPT
SCHEMBL6689866 0.75 PARP10 (0.32) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed