SCHEMBL6721095

SCHEMBL6721095

CC(C)(C)SC(=S)c1ccc(C(=O)Oc2ccccc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.53
TDP1 Q9NUW8 2/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
KMT2A Q03164 7/20 0.49
ALDH1A1 P00352 5/20 0.49
PKM P14618 1/20 0.49
SMN1; SMN2 Q16637 2/20 0.48
PARP10 Q53GL7 1/20 0.47
TMPRSS15 P98073 2/20 0.47
PRSS1 P07477 1/20 0.47
ACR P10323 1/20 0.47
NSD2 O96028 1/20 0.44
MEN1 O00255 3/20 0.43
ALOX5 P09917 1/20 0.43
ELANE P08246 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16300498 0.83 KMT2A (0.53) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL6721100 0.81 PARP10 (0.44) MAPTL3MBTL1KMT2AALDH1A1SMN1; SMN2
SCHEMBL6721098 0.79 ALDH1A1 (0.50) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL236901 0.78 ALDH1A1 (0.41) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL70034 0.78 PARP10 (0.70) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL1790578 0.76 MAPT (0.87) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL678424 0.76 MAPT (0.70) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL6721066 0.75 SMN1; SMN2 (0.44) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL6721029 0.75 PARP10 (0.46) MAPTTDP1L3MBTL1KMT2AALDH1A1
SCHEMBL16300513 0.74 ELANE (0.73) MAPTTDP1L3MBTL1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed