SCHEMBL6721066

SCHEMBL6721066

CC(C)(C)SC(=S)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 5/20 0.44
MAPT P10636 4/20 0.44
GAA P10253 2/20 0.42
KDM4E B2RXH2 2/20 0.42
MEN1 O00255 1/20 0.42
AGTR1 P30556 1/20 0.42
HTT P42858 1/20 0.42
KMT2A Q03164 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.40
WDR5 P61964 1/20 0.39
NCOA3 Q9Y6Q9 2/20 0.39
FAAH O00519 1/20 0.39
MGLL Q99685 1/20 0.39
ALDH1A1 P00352 3/20 0.38
LMNA P02545 1/20 0.38
ALOX12 P18054 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HPGD P15428 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL236901 0.88 ALDH1A1 (0.41) SMN1; SMN2MAPTGAAKDM4EMEN1
SCHEMBL6721098 0.81 ALDH1A1 (0.50) MAPTMEN1KMT2AL3MBTL1ALDH1A1
SCHEMBL6721100 0.80 PARP10 (0.44) SMN1; SMN2MAPTMEN1HTTKMT2A
SCHEMBL6720995 0.80 SMN1; SMN2 (0.39) SMN1; SMN2MAPTGAAKDM4EMEN1
SCHEMBL16300509 0.78 SMN1; SMN2 (0.48) SMN1; SMN2MAPTGAAKDM4EMEN1
SCHEMBL237352 0.77 SMN1; SMN2 (0.46) SMN1; SMN2MAPTGAAMEN1KMT2A
SCHEMBL6721095 0.75 MAPT (0.53) SMN1; SMN2MAPTMEN1KMT2AL3MBTL1
Biphenyl SCHEMBL11439633 0.74 ALDH1A1 (0.36) SMN1; SMN2MAPTGAAKDM4EMEN1
SCHEMBL6721059 0.74 CES2 (0.46) SMN1; SMN2MAPTKDM4EMEN1KMT2A
SCHEMBL23743522 0.73 CES2 (0.45) SMN1; SMN2MAPTGAAKDM4EHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed