Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | BRS3 | P32247 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25802902 | 1.00 | SLC6A3 (0.31) | SLC6A3EPHX2ALDH1A1HSD17B10BRS3 | |
| SCHEMBL677843 | 0.88 | EPHX2 (0.31) | SLC6A3EPHX2ALDH1A1HSD17B10BRS3 | |
| SCHEMBL17247238 | 0.87 | ALDH1A1 (0.33) | EPHX2ALDH1A1 | |
| SCHEMBL6105744 | 0.84 | EPHX2 (0.31) | SLC6A3EPHX2BRS3 | |
| SCHEMBL3674828 | 0.83 | SLC6A3 (0.34) | SLC6A3EPHX2HSD17B10BRS3 | |
| SCHEMBL15836512 | 0.82 | EPHX2 (0.30) | SLC6A3EPHX2BRS3 | |
| SCHEMBL16807396 | 0.82 | EPHX2 (0.34) | EPHX2ALDH1A1 | |
| SCHEMBL4900373 | 0.82 | SLC6A3 (0.33) | SLC6A3EPHX2BRS3 | |
| SCHEMBL15840370 | 0.82 | SLC6A3 (0.34) | SLC6A3EPHX2 | |
| SCHEMBL16807395 | 0.81 | EPHX2 (0.35) | EPHX2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7037995-B2 | Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-05-02 | — | — | US | claimed |
| US-20260078079-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | OSMO LABS PBC (US) | 2026-03-19 | — | — | US | disclosed |
| US-20240241440-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20060166136-A1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-07-27 | — | — | US | disclosed |
| EP-1684119-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-07-26 | — | — | EP | disclosed |
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-20 | — | — | US | disclosed |
| US-20060105267-A1 | Positive resist containing naphthol functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2006-05-18 | — | — | US | disclosed |
| US-20040197707-A1 | Positive resist composition and method of pattern formation using the same | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-20040191676-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-09-30 | — | — | US | disclosed |
| US-6753124-B2 | AMPLIFIED POSITIVE PHOTORESISTS | JSR CORPORATION (JP) | 2004-06-22 | — | — | US | disclosed |
| JP-2003255539-A | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP | 2003-09-10 | — | — | JP | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | SLC6A3 4620/4885EPHX2 4257/4885ALDH1A1 382/4885 |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | CRY1, CBR3, C1S | SLC6A3 3331/4885EPHX2 1707/4885ALDH1A1 810/4885 |
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | HCAR1, HCAR2, RARA | SLC6A3 4042/4885EPHX2 60/4885ALDH1A1 20/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | SLC6A3 2766/4885EPHX2 919/4885ALDH1A1 3079/4885 |
| US-20260078079-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | CBR1, CBR3, TAS2R1 | SLC6A3 4858/4885EPHX2 154/4885ALDH1A1 804/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.