SCHEMBL685647

SCHEMBL685647

C=Cc1ccc(OC(C)OCCOc2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 6/20 0.46
CHRNB4 P30926 4/20 0.46
CHRNA3 P32297 4/20 0.46
CHRNB2 P17787 4/20 0.46
CHRNA4 P43681 3/20 0.46
KDM4E B2RXH2 3/20 0.40
HPGD P15428 3/20 0.40
TP53 P04637 2/20 0.40
CYP2D6 P10635 2/20 0.40
HSD17B10 Q99714 2/20 0.40
ALDH1A1 P00352 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 1/20 0.40
MEN1 O00255 1/20 0.40
CYP1A2 P05177 1/20 0.40
ALOX15 P16050 1/20 0.40
THRB P10828 1/20 0.40
CHRNA10 Q9GZZ6 2/20 0.40
CHRNA9 Q9UGM1 2/20 0.40
APOBEC3A P31941 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL684984 0.96 LTA4H (0.45) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL6536644 0.89 CHRNB2 (0.49) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL685743 0.89 CHRNA7 (0.46) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL9963793 0.83 CHRNB2 (0.34) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL3695401 0.83 ALDH1A1 (0.48) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL685739 0.83 PPARG (0.38) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL3695404 0.83 CHRNA7 (0.56) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL14944170 0.81 ALOX15 (0.37) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL6757938 0.81 PPARG (0.35) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4
SCHEMBL5693002 0.81 CHRNA7 (0.47) CHRNA7CHRNB4CHRNA3CHRNB2CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10766992-B2 Resin and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-09-08 US disclosed
US-10377692-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-13 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-20100323296-A1 RESIN AND RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-23 US disclosed
US-20100323296-A1 RESIN AND RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-23 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110059400-A1 PHOTORESIST COMPOSITION C1R, C1S, CCNT1 CHRNA7 2055/4885CHRNB4 3378/4885CHRNA3 1683/4885
US-20110065047-A1 PHOTORESIST COMPOSITION C1R, C1S, RER1 CHRNA7 2980/4885CHRNB4 3816/4885CHRNA3 2596/4885
US-20110065040-A1 PHOTORESIST COMPOSITION C1R, P4HA1, C1S CHRNA7 3065/4885CHRNB4 3787/4885CHRNA3 2582/4885
US-10377692-B2 Photoresist composition C1R, C1S, F12 CHRNA7 2157/4885CHRNB4 3503/4885CHRNA3 1736/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.