SCHEMBL6766191

SCHEMBL6766191

COc1ccc(CS(=O)(=O)O)cc1.O=C1CCC(=O)N1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.45
CRBN Q96SW2 1/20 0.42
GAA P10253 3/20 0.42
PLCG1 P19174 1/20 0.42
MMP2 P08253 3/20 0.41
MMP9 P14780 2/20 0.41
MMP12 P39900 2/20 0.41
MMP14 P50281 2/20 0.41
MMP1 P03956 1/20 0.41
MMP3 P08254 1/20 0.41
MMP7 P09237 1/20 0.41
MMP8 P22894 1/20 0.41
MMP13 P45452 1/20 0.41
MMP16 P51512 1/20 0.41
ADAM17 P78536 1/20 0.41
CMA1 P23946 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
KMT2A Q03164 4/20 0.41
ATM Q13315 1/20 0.41
MEN1 O00255 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL294920 0.84 APLNR (0.52) POLBPLCG1KMT2AMEN1
Hydrochloric Acid SCHEMBL28180679 0.82 APLNR (0.50) PLCG1KMT2AMEN1
SCHEMBL65073 0.80 PKM (0.51) POLBGAAMMP2MMP9MMP12
SCHEMBL64832 0.71 KMT2A (0.30) KMT2A
SCHEMBL2717301 0.69 KMT2A (0.57) CRBNPLCG1CMA1SMN1; SMN2KMT2A
SCHEMBL41389 0.69 CMA1 (0.70) POLBGAACMA1KMT2AMEN1
SCHEMBL8474031 0.69 CA2 (0.41) MMP2MMP9MMP1MMP8MMP13
SCHEMBL294919 0.68 APLNR (0.53) PLCG1CMA1SMN1; SMN2KMT2AALDH1A1
SCHEMBL30496480 0.68 PKM (0.56) CRBNPLCG1SMN1; SMN2KMT2AMEN1
SCHEMBL3237396 0.68 PKM (0.56) CRBNPLCG1SMN1; SMN2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6730453-B2 POLYSILSESQUIOXANE POLYMERS CONTAINING CARBOXY OR HYDROXY GROUPS, AND A PHOTOACID GENERATOR SHIN ETSU CHEMICAL CO., LTD. (JP) 2004-05-04 US disclosed
US-20020058205-A1 High molecular weight silicone compounds, resist compositions, and patterning method NAKASHIMA MUTSUO (JP) 2002-05-16 US disclosed
US-6309796-B1 PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-30 US disclosed
US-5972560-A A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-10-26 US disclosed