Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 5/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.56 |
| ▸ | CYP2D6 | P10635 | 4/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.56 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.56 |
| ▸ | LTA4H | P09960 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | GABRP | O00591 | 1/20 | 0.44 |
| ▸ | GABRD | O14764 | 1/20 | 0.44 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.44 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.44 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.44 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.44 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.44 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.44 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.44 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.44 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.44 |
| ▸ | GABRE | P78334 | 1/20 | 0.44 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29379587 | 1.00 | CYP2C19 (0.56) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL423447 | 0.94 | CYP2D6 (0.50) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL3221935 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL675902 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL29869794 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL7453009 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL28251708 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL4885285 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL21494430 | 0.92 | SOAT1 (0.49) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 | |
| SCHEMBL1268914 | 0.89 | NPC1 (0.44) | CYP2C19CYP2C9CYP2D6CYP1A2CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1294 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| US-20250075147-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NEW FLAVOR AND FRAGRANCE INGREDIENTS | OSMO LABS, PBC | 2025-03-06 | — | — | US | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| CN-107407878-B | Photosensitive resin composition | 东丽株式会社 | 2020-11-17 | — | — | CN | claimed |
| US-7396633-B2 | Damascene process; forming connectors; exposure; development; using acid generator, quencher and buffer | NEC ELECTRONICS CORPORATION (JP) | 2008-07-08 | — | — | US | claimed |
| US-20040259029-A1 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | claimed |
| EP-0204535-B1 | N-FLUOROPYRIDINIUM SALT AND PROCESS FOR PREPARING SAME | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1992-08-19 | — | — | EP | claimed |
| JP-1075468-A | — | — | None | — | — | JP | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675357-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-3952026-A | FLAVOR ADDITIVE FOR FOODS AND BEVERAGES | FIRMENICH & CIE (CH) | 1976-04-20 | — | — | US | disclosed |
| US-3952024-A | FLAVOR ADDITIVE FOR FOODS AND BEVERAGES | FIRMENICH & CIE (CH) | 1976-04-20 | — | — | US | disclosed |
| US-3943260-A | TETRAHYDRO-THIO-PHEN-3-ONES | FIRMENICH & CIE (CH) | 1976-03-09 | — | — | US | disclosed |
| US-3931166-A | FLAVORANTS | FIRMENICH & CIE (CH) | 1976-01-06 | — | — | US | disclosed |
| US-3931246-A | FURYLALKYL-THIOETHERS | FIRMENICH & CIE (CH) | 1976-01-06 | — | — | US | disclosed |
| US-3931245-A | FURYLALKYLTHIOL CARBOXYLATES | FIRMENICH & CIE (CH) | 1976-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260008932-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS | ASH2L, ALKBH2, ITGA1 | CYP2C19 2676/4885CYP2C9 2508/4885CYP2D6 3471/4885 |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | RAD51, CDH1, SMC2 | CYP2C19 4168/4885CYP2C9 4016/4885CYP2D6 4449/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | CYP2C19 3261/4885CYP2C9 3892/4885CYP2D6 4404/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.