Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1826303 | 0.92 | CYP1A2 (0.35) | CYP1A2CYP2C19KDM4ETSHRTDP1 | |
| SCHEMBL8737653 | 0.90 | CYP1A2 (0.37) | CYP1A2CYP2C19KDM4ETSHRTDP1 | |
| SCHEMBL8737651 | 0.90 | CYP1A2 (0.37) | CYP1A2CYP2C19KDM4ETSHRTDP1 | |
| SCHEMBL1825799 | 0.82 | — | — | |
| SCHEMBL21831407 | 0.76 | — | — | |
| SCHEMBL13013073 | 0.75 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL9947107 | 0.75 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL1358616 | 0.74 | KDM4E (0.34) | CYP1A2CYP2C19KDM4ETSHRTDP1 | |
| SCHEMBL24871279 | 0.74 | CYP1A2 (0.33) | CYP1A2CYP2C19KDM4ETSHRTDP1 | |
| SCHEMBL5984053 | 0.74 | KDM4E (0.40) | CYP1A2CYP2C19KDM4ETSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108042514-A | Cause the method for anesthesia | 加利福尼亚大学董事会 | 2018-05-18 | — | — | CN | claimed |
| WO-2023211103-A1 | FLUORINATED ALKYL SULFONE COMPOUND, AND NON-AQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND SECONDARY BATTERY INCLUDING SAME | 주식회사 천보 | 2023-11-02 | — | — | WO | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| EP-3922627-A1 | COMPOUND AND LIGHT EMITTING ELEMENT USING SAME | Sumitomo Chemical Company, Ltd. (JP) | 2021-12-15 | — | — | EP | disclosed |
| WO-2020054559-A1 | FLUORINE-CONTAINING RESIN COMPOSITION | セントラル硝子株式会社 | 2020-03-19 | — | — | WO | disclosed |
| CN-110168704-A | Substrate processing method using same and substrate board treatment | 株式会社斯库林集团 | 2019-08-23 | — | — | CN | disclosed |
| CN-109904093-A | Substrate processing method and substrate processing apparatus | 株式会社斯库林集团 | 2019-06-18 | — | — | CN | disclosed |
| CN-109545655-A | Substrate processing method and substrate processing device | 株式会社斯库林集团 | 2019-03-29 | — | — | CN | disclosed |
| CN-109309032-A | Substrate processing method using same and substrate board treatment | 株式会社斯库林集团 | 2019-02-05 | — | — | CN | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| WO-2008011518-A2 | ENCAPSULATION SYSTEM | DIAKINE THERAPEUTICS, INC. (US) | 2008-01-24 | — | — | WO | disclosed |
| WO-2007146786-A1 | PHARMACEUTICAL COMPOSITIONS AND METHODS FOR RESTORING B-CELL MASS AND FUNCTION | DIAKINE THERAPEUTICS, INC. (US) | 2007-12-21 | — | — | WO | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20070160929-A1 | photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. | 2007-07-12 | — | — | US | disclosed |
| US-7217492-B2 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| WO-2006074051-A2 | PHARMACEUTICAL COMPOSITIONS AND METHODS FOR RESTORING β-CELL MASS AND FUNCTION | DIAKINE THERAPEUTICS, INC. (US) | 2006-07-13 | — | — | WO | disclosed |
| US-20050053861-A1 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-03-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230205083-A1 | SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A9, SLC6A5, REN | CYP1A2 4266/4885CYP2C19 3469/4885KDM4E 3950/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.