Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25685792 | 1.00 | CYP1A2 (0.37) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL25808510 | 1.00 | CYP1A2 (0.37) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL25685794 | 1.00 | CYP1A2 (0.37) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL8737653 | 1.00 | CYP1A2 (0.37) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL1826303 | 0.97 | CYP1A2 (0.35) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL681583 | 0.90 | CYP1A2 (0.34) | CYP1A2CYP2C19TSHRGAAKDM4E | |
| SCHEMBL13613264 | 0.81 | CYP1A2 (0.36) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL13613268 | 0.81 | CYP1A2 (0.36) | CYP1A2CYP2C9CYP2C19RECQLTSHR | |
| SCHEMBL13013080 | 0.81 | TSHR (0.31) | TSHRTDP1 | |
| SCHEMBL13013077 | 0.81 | TSHR (0.31) | TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230189636-A1 | COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF | DUK SAN NEOLUX CO., LTD. (KR) | 2023-06-15 | — | — | US | disclosed |
| US-10014474-B2 | Composition for forming gate insulating film, organic thin film transistor, electronic paper, and display device | FUJIFILM CORPORATION (JP) | 2018-07-03 | — | — | US | disclosed |
| US-10008301-B2 | Organic semiconductor composition, organic thin-film transistor, electronic paper, and display device | FUJIFILM CORPORATION (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9859036-B2 | Conductive film forming composition, conductive film, and wiring board | FUJIFILM CORPORATION (JP) | 2018-01-02 | — | — | US | disclosed |
| EP-2704683-B1 | CHROMOPHORES WITH PERFLUOROALKYL SUBSTITUENTS | BASF SE (DE) | 2017-10-18 | — | — | EP | disclosed |
| US-9609747-B2 | Wiring board | FUJIFILM CORPORATION (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9388206-B2 | Chromophores with perfluoroalkyl substituents | BASF SE (DE) | 2016-07-12 | — | — | US | disclosed |
| US-9310682-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20160087208-A1 | COMPOSITION FOR FORMING GATE INSULATING FILM, ORGANIC THIN FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-03-24 | — | — | US | disclosed |
| US-20160071624-A1 | ORGANIC SEMICONDUCTOR COMPOSITION, ORGANIC THIN-FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2016-03-10 | — | — | US | disclosed |
| US-20100055608-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-7670751-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20090269696-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090233223-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | PROXIMAL SYSTEMS CORPORATION | 2009-03-05 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070160929-A1 | photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. | 2007-07-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230189636-A1 | COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF | EMC1, EMC2, EPCAM | CYP1A2 1633/4885CYP2C9 885/4885CYP2C19 1023/4885 |
| US-10014474-B2 | Composition for forming gate insulating film, organic thin film transistor, electronic paper, and display device | TEC, EPCAM, MIF | CYP1A2 2764/4885CYP2C9 1664/4885CYP2C19 998/4885 |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | RER1, CRY1, CYP21A2 | CYP1A2 799/4885CYP2C9 827/4885CYP2C19 820/4885 |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR5, RER1, H1-5 | CYP1A2 2348/4885CYP2C9 2436/4885CYP2C19 2097/4885 |
| US-20100055608-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ARSA, ACSL3, RAD54L | CYP1A2 2528/4885CYP2C9 2709/4885CYP2C19 3199/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.