Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.40 |
| ▸ | MTNR1B | P49286 | 5/20 | 0.39 |
| ▸ | MTNR1A | P48039 | 4/20 | 0.39 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.36 |
| ▸ | HTR2A | P28223 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18903250 | 0.84 | ESR1 (0.57) | ESR1CYP19A1ESR2MTNR1BMTNR1A | |
| SCHEMBL686106 | 0.83 | APLNR (0.47) | HTR2AKDM4EALDH1A1 | |
| SCHEMBL683451 | 0.82 | ABCB11 (0.40) | ESR1CYP19A1ESR2ABCB11HTR2A | |
| SCHEMBL14196450 | 0.82 | ALDH1A1 (0.39) | ESR1CYP19A1ESR2MTNR1BMTNR1A | |
| SCHEMBL2061056 | 0.75 | KDM4E (0.50) | ESR1CYP19A1ESR2KDM4EALDH1A1 | |
| SCHEMBL683151 | 0.74 | CALM1 (0.51) | ALDH1A1 | |
| SCHEMBL16952197 | 0.74 | KDM4E (0.44) | ESR1CYP19A1ESR2MTNR1BMTNR1A | |
| SCHEMBL683440 | 0.71 | ALDH1A1 (0.47) | KDM4EALDH1A1 | |
| SCHEMBL13221006 | 0.70 | HSD17B10 (0.47) | KDM4EALDH1A1 | |
| SCHEMBL16884629 | 0.70 | DAO (0.43) | ESR1CYP19A1ESR2MTNR1BMTNR1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |