SCHEMBL685626

SCHEMBL685626

C=Cc1ccc(O)c(OCCCCCC)c1

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.57
SMPD1 P17405 1/20 0.53
ALDH1A1 P00352 1/20 0.49
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
STK17B O94768 1/20 0.46
APP P05067 4/20 0.46
ESR1 P03372 2/20 0.46
TOP2A P11388 1/20 0.43
CNR1 P21554 1/20 0.43
CNR2 P34972 1/20 0.43
PRKCE Q02156 1/20 0.43
PRKCQ Q04759 1/20 0.43
PRKCD Q05655 1/20 0.43
ABL1 P00519 1/20 0.43
ABCB1 P08183 1/20 0.43
BCR P11274 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685917 0.98 TRPA1 (0.58) TRPA1SMPD1ALDH1A1MEN1KMT2A
SCHEMBL28388362 0.89 TRPA1 (0.62) TRPA1SMPD1ALDH1A1MEN1KMT2A
SCHEMBL3761372 0.86 ALDH1A1 (0.43) TRPA1SMPD1ALDH1A1CNR2PRKCE
SCHEMBL11503669 0.85 ALDH1A1 (0.69) SMPD1ALDH1A1MEN1KMT2ASTK17B
SCHEMBL14856076 0.85 ALDH1A1 (0.69) SMPD1ALDH1A1MEN1KMT2ASTK17B
SCHEMBL31500474 0.84 TYR (0.58) SMPD1ALDH1A1MEN1KMT2AAPP
SCHEMBL1967921 0.83 TLR8 (0.40) TRPA1ALDH1A1MEN1KMT2AAPP
SCHEMBL15899460 0.83 TLR8 (0.40) TRPA1ALDH1A1MEN1KMT2AAPP
SCHEMBL15899585 0.83 TLR8 (0.40) TRPA1ALDH1A1MEN1KMT2AAPP
SCHEMBL14323012 0.83 ALDH1A1 (0.71) SMPD1ALDH1A1MEN1KMT2ASTK17B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10377692-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-13 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-9346750-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-24 US disclosed
US-9346750-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-24 US disclosed
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-9063414-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-23 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110059400-A1 PHOTORESIST COMPOSITION C1R, C1S, CCNT1 TRPA1 59/4885SMPD1 4706/4885ALDH1A1 2162/4885
US-20110065047-A1 PHOTORESIST COMPOSITION C1R, C1S, RER1 TRPA1 786/4885SMPD1 4721/4885ALDH1A1 1016/4885
US-20110065040-A1 PHOTORESIST COMPOSITION C1R, P4HA1, C1S TRPA1 951/4885SMPD1 4727/4885ALDH1A1 706/4885
US-10377692-B2 Photoresist composition C1R, C1S, F12 TRPA1 79/4885SMPD1 4720/4885ALDH1A1 2217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.