Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | MGLL | Q99685 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12018885 | 0.95 | LMNA (0.55) | LMNAPOLBALDH1A1 | |
| SCHEMBL12018887 | 0.90 | LMNA (0.44) | LMNAPOLBALDH1A1 | |
| SCHEMBL686296 | 0.90 | LMNA (0.51) | LMNAPOLBALDH1A1MGLL | |
| SCHEMBL12018897 | 0.85 | LMNA (0.56) | LMNAPOLBALDH1A1MGLL | |
| SCHEMBL17589196 | 0.83 | LMNA (0.49) | LMNAPOLBALDH1A1MGLL | |
| SCHEMBL24775803 | 0.82 | LMNA (0.58) | LMNAPOLBALDH1A1 | |
| SCHEMBL2605946 | 0.81 | LMNA (0.47) | LMNAPOLBALDH1A1MGLL | |
| SCHEMBL12018894 | 0.80 | LMNA (0.45) | LMNAPOLBALDH1A1MGLL | |
| SCHEMBL12018886 | 0.80 | ALDH1A1 (0.50) | ALDH1A1MGLL | |
| SCHEMBL18923158 | 0.80 | LMNA (0.46) | LMNAPOLBALDH1A1MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9791776-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-17 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9268226-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9260407-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9221785-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |
| US-9063414-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-23 | — | — | US | disclosed |
| US-20150132698-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-14 | — | — | US | disclosed |
| US-8993210-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110053086-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY,LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110039208-A1 | PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110039209-A1 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110033804-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | THEM6, INTS6, CRY1 | LMNA 2959/4885POLB 2255/4885ALDH1A1 2847/4885 |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | C1R, C1S, CCNT1 | LMNA 1843/4885POLB 2607/4885ALDH1A1 2162/4885 |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, H1-2 | LMNA 930/4885POLB 3703/4885ALDH1A1 918/4885 |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, XPOT, ERCC4 | LMNA 547/4885POLB 80/4885ALDH1A1 4445/4885 |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, NPPA, ERCC4 | LMNA 444/4885POLB 291/4885ALDH1A1 3326/4885 |
| US-20110053086-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | OR10J3, C1R, C9 | LMNA 3592/4885POLB 2945/4885ALDH1A1 2546/4885 |
| US-20110039209-A1 | COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RCOR3, RCN1, HRH4 | LMNA 4120/4885POLB 4125/4885ALDH1A1 1871/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.