SCHEMBL6858563

SCHEMBL6858563

C=C(C)C(=O)OC1(C[Si](C)(C)C)CC[Si](C)(C)CC1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7670663 0.84 THRB (0.33) ALDH1A1
SCHEMBL6855938 0.83 ALDH1A1 (0.36) ALDH1A1
SCHEMBL6854370 0.82 ALDH1A1 (0.35) ALDH1A1
SCHEMBL6854178 0.81 ALDH1A1 (0.33) ALDH1A1
SCHEMBL7667569 0.78 THRB (0.31) ALDH1A1
SCHEMBL5380855 0.75 ALDH1A1 (0.35) ALDH1A1
SCHEMBL7665648 0.71 TSHR (0.34) ALDH1A1
SCHEMBL7666853 0.70
SCHEMBL673334 0.69 ALDH1A1 (0.39) ALDH1A1
SCHEMBL6854174 0.68 ALDH1A1 (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6780563-B2 SENSITIVITY AND RESOLUTION, RESISTANCE TO OXYGEN PLASMA ETCHING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-24 US disclosed
US-20020061465-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-23 US disclosed