Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | FBP1 | P09467 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1057422 | 0.89 | KMT2A (0.44) | ALDH1A1KMT2ALMNAMEN1MAPK1 | |
| SCHEMBL14962143 | 0.88 | ALDH1A1 (0.42) | ALDH1A1KMT2ATDP1GPR35MEN1 | |
| SCHEMBL16924653 | 0.88 | ALDH1A1 (0.42) | ALDH1A1KMT2ALMNASMN1; SMN2GAA | |
| SCHEMBL16225601 | 0.86 | KMT2A (0.54) | KMT2ALMNAMEN1TP53 | |
| SCHEMBL15969165 | 0.85 | ALDH1A1 (0.44) | ALDH1A1KMT2AGAATDP1GPR35 | |
| SCHEMBL15969811 | 0.84 | TGM2 (0.45) | ALDH1A1KMT2ALMNASMN1; SMN2MEN1 | |
| SCHEMBL6865965 | 0.84 | MAOB (0.51) | ALDH1A1KMT2ALMNASMN1; SMN2MEN1 | |
| SCHEMBL1056789 | 0.84 | MGLL (0.54) | KMT2ALMNAMEN1TP53 | |
| SCHEMBL2472414 | 0.81 | TDP1 (0.43) | ALDH1A1KMT2ALMNASMN1; SMN2TDP1 | |
| SCHEMBL15969764 | 0.81 | ALDH1A1 (0.48) | ALDH1A1KMT2ALMNASMN1; SMN2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6815142-B1 | Method for forming resist pattern, and overlying layer material and semiconductor device used for forming resist pattern | RENESAS TECHNOLOGY CORP. (JP) | 2004-11-09 | — | — | US | disclosed |