SCHEMBL6882874

SCHEMBL6882874

CCOC(C)OC=Cc1ccc(C(C)(C)Oc2ccc(C=CC=Cc3ccc(O)cc3)cc2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.36
STAT3 P40763 1/20 0.35
ABCG2 Q9UNQ0 3/20 0.34
MAOB P27338 1/20 0.34
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA7 P43166 2/20 0.33
CA9 Q16790 2/20 0.33
CA14 Q9ULX7 2/20 0.33
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
TTR P02766 2/20 0.32
CYP1A1 P04798 2/20 0.32
ALOX5 P09917 2/20 0.32
PTGS2 P35354 2/20 0.32
CYP1B1 Q16678 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6873848 0.86 APP (0.33) APPSTAT3ABCG2MAOBCA12
SCHEMBL7142222 0.85 CHRNB2 (0.32) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL7645374 0.81 CA12 (0.44) APPABCG2MAOBCA12CA1
SCHEMBL4968520 0.79 FBP1 (0.33) MAOBCYP1A1PTGS2CYP1B1FBP1
SCHEMBL5676063 0.77 STAT3 (0.34) STAT3ABCG2MAOBCA12CA1
SCHEMBL3264447 0.76 APP (0.47) APPSTAT3ABCG2MAOBCA12
SCHEMBL6875173 0.74 STAT3 (0.37) APPSTAT3MAOBTTRCYP1A1
SCHEMBL6865759 0.74 STAT3 (0.33) APPSTAT3ABCG2MAOBCA12
SCHEMBL8755230 0.72 APP (0.48) APPSTAT3ABCG2MAOBCA12
SCHEMBL6867017 0.71 FBP1 (0.34) PTGS2FBP1MAPTNPC1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6716573-B2 Resist Composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-06 US disclosed
US-6586152-B1 Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-07-01 US disclosed
US-20030039920-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-02-27 US disclosed
US-6432608-B1 FINENESS PATTERN WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2002-08-13 US disclosed