SCHEMBL4968520

SCHEMBL4968520

CCOC(C)Oc1ccc(C=CC=Cc2ccc(OC(C)(C)c3ccc(C=CO)cc3)cc2)cc1

nearest known ligand 0.33

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
FBP1 P09467 1/20 0.33
CYP1A1 P04798 1/20 0.31
CYP1B1 Q16678 1/20 0.31
MAOB P27338 1/20 0.31
BCHE P06276 1/20 0.31
ACHE P22303 1/20 0.31
PTGS2 P35354 1/20 0.31
ALDH1A3 P47895 1/20 0.31
LTB4R Q15722 1/20 0.30
LTB4R2 Q9NPC1 1/20 0.30
TAS1R3 Q7RTX0 1/20 0.30
TAS1R1 Q7RTX1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7263913 0.88 ALDH1A3 (0.33) CYP1A1CYP1B1MAOBPTGS2ALDH1A3
SCHEMBL7271025 0.87 FBP1 (0.32) FBP1CYP1A1CYP1B1MAOBBCHE
SCHEMBL6278450 0.86 CYP1A1 (0.32) CYP1A1CYP1B1MAOBBCHEACHE
SCHEMBL7269894 0.85 PPARG (0.39) CYP1A1MAOBLTB4RLTB4R2
SCHEMBL3842762 0.85 PPARG (0.33) FBP1
SCHEMBL6867017 0.83 FBP1 (0.34) FBP1BCHEACHEPTGS2ALDH1A3
SCHEMBL6882874 0.79 APP (0.36) FBP1CYP1A1CYP1B1MAOBPTGS2
SCHEMBL7265039 0.79 TRPM8 (0.32)
SCHEMBL3264447 0.78 APP (0.47) CYP1A1CYP1B1MAOBPTGS2
SCHEMBL4967712 0.77 ELANE (0.34) FBP1MAOBBCHEACHEPTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1314725-B1 SULFONIUM SALT COMPOUND WAKO PURE CHEM IND LTD (JP) 2008-03-19 EP disclosed
US-7022456-B2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 2006-04-04 US disclosed
US-6924323-B2 Sulfonium salt compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-02 US disclosed
US-6743562-B2 ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 2004-06-01 US disclosed
US-6723483-B1 Sulfonium salt compounds WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-20 US disclosed
US-20040048190-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. 2004-03-11 US disclosed
US-20040033434-A1 Sulfonium salt compound FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2004-02-19 US disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1314725-A1 SULFONIUM SALT COMPOUND Wako Pure Chemical Industries, Ltd. (JP) 2003-05-28 EP disclosed
US-20020172886-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. 2002-11-21 US disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040033434-A1 Sulfonium salt compound SPIN1, RER1, SPIN2B FBP1 1493/4885CYP1A1 767/4885CYP1B1 365/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.