SCHEMBL688424

SCHEMBL688424

NC(=O)NCc1cccc2[nH]nnc12

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 3/20 0.39
RECQL P46063 1/20 0.38
MTNR1B P49286 2/20 0.38
POLB P06746 1/20 0.36
ADORA2A P29274 1/20 0.35
ADORA1 P30542 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
TERT O14746 5/20 0.35
ALDH1A1 P00352 2/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
CNR2 P34972 2/20 0.34
KDM4E B2RXH2 1/20 0.34
NPC1 O15118 1/20 0.34
GAA P10253 1/20 0.34
P2RX7 Q99572 2/20 0.33
PARP1 P09874 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL579870 0.88 NPC1 (0.44) ADORA2AADORA1TERTALDH1A1L3MBTL1
SCHEMBL30733160 0.82 MPO (0.40) MTNR1AMTNR1BALDH1A1GAAPARP1
SCHEMBL2725013 0.80 GAA (0.44) ALDH1A1KDM4EGAAPARP1
SCHEMBL5545998 0.80 THRB (0.31)
SCHEMBL3403842 0.79 MC5R (0.38) TERTALDH1A1KDM4E
SCHEMBL30589581 0.79 BCHE (0.45) POLBL3MBTL1KDM4EPARP1
SCHEMBL18803144 0.79 BCHE (0.45) POLBL3MBTL1KDM4EPARP1
SCHEMBL1252530 0.77 PKM (0.34) GAAPARP1
SCHEMBL656754 0.76 PARP1 (0.36) ALDH1A1L3MBTL1CNR2KDM4ENPC1
SCHEMBL30829735 0.76 PARP1 (0.36) ALDH1A1L3MBTL1CNR2KDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0960725-B1 Resin-coated composite foil, production and use thereof MITSUI MINING & SMELTING CO (JP) 2008-03-12 EP claimed
US-6652962-B1 Release layer containing a benzotriazole MITSUI MINING & SMELTING CO. LTD. (JP) 2003-11-25 US claimed
EP-0930811-B1 Composite copper foil, process for preparing the same, and copper-clad laminate and printed wiring board using the same MITSUI MINING & SMELTING CO (JP) 2003-08-20 EP claimed
EP-0960725-A2 Resin-coated composite foil, production and use thereof Mitsui Mining & Smelting Co., Ltd. (JP) 1999-12-01 EP claimed
CN-118339932-A Wiring substrate with support, method for manufacturing wiring substrate with support, and method for manufacturing electronic component mounting substrate MGC电子科技有限公司 2024-07-12 CN disclosed
CN-118234118-A Peelable metal foil, metal-clad laminate, wiring board, and semiconductor material 广州方邦电子股份有限公司 2024-06-21 CN disclosed
CN-118234116-A Peelable metal foil, metal-clad laminate, wiring board, and semiconductor material 广州方邦电子股份有限公司 2024-06-21 CN disclosed
CN-118215209-A Peelable metal foil, metal-clad laminate, wiring board, and semiconductor material 广州方邦电子股份有限公司 2024-06-18 CN disclosed
CN-113825316-B Method for producing laminate and resin layer-attached metal foil 三井金属矿业株式会社 2024-06-11 CN disclosed
US-11999131-B2 Roll-bonded laminate and method for producing the same TOYO KOHAN CO., LTD. (JP) 2024-06-04 US disclosed
CN-118043958-A Method for manufacturing package substrate for mounting semiconductor element and laminate with support substrate MGC电子科技有限公司 2024-05-14 CN disclosed
CN-118020150-A Method for manufacturing package substrate for mounting semiconductor element MGC电子科技有限公司 2024-05-10 CN disclosed
CN-1293234-C Electrodeposited copper foil with carrier and copper-clad laminate produced using the electrodeposited copper foil MITSUI MINING & SMELTING CO (JP) 2007-01-03 CN disclosed
CN-1293236-C Electrodeposited copper foil with carrier and method for manufacturing the same MITSUI MINING & SMELTING CO (JP) 2007-01-03 CN disclosed
CN-1276997-C Method for producing electrolytic copper foil with carrier foil for high-temperature heat resistance and electrolytic copper foil produced by the method MITSUI MINING & SMELTING CO (JP) 2006-09-27 CN disclosed
US-20040241487-A1 Electrodeposited copper foil with carrier foil MITSUI MINING & SMELTING CO., LTD. (JP) 2004-12-02 US disclosed
CN-1533450-A Method for producing electrolytic copper foil with carrier foil for high-temperature heat resistance and electrolytic copper foil produced by the method ���������kҵ��ʽ���� 2004-09-29 CN disclosed
CN-1335898-A Electrodeposited copper foil with carrier and method for manufacturing the same MITSUI MINING & SMELTING CO (JP) 2002-02-13 CN disclosed
CN-1335897-A Electrodeposited copper foil with carrier and copper-clad laminate produced using the electrodeposited copper foil MITSUI MINING & SMELTING CO (JP) 2002-02-13 CN disclosed
EP-0960725-A2 Resin-coated composite foil, production and use thereof Mitsui Mining & Smelting Co., Ltd. (JP) 1999-12-01 EP disclosed