SCHEMBL68908

SCHEMBL68908

CC(Cl)[SiH2]c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
TAAR1 Q96RJ0 5/20 0.36
CYP2D6 P10635 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
AOC3 Q16853 2/20 0.32
MAOA P21397 2/20 0.32
MAOB P27338 1/20 0.32
TRPA1 O75762 2/20 0.31
RIPK1 Q13546 1/20 0.31
SLC6A2 P23975 2/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31
SIGMAR1 Q99720 1/20 0.31
CYP2A6 P11509 1/20 0.31
ADORA2A P29274 1/20 0.31
ADORA1 P30542 1/20 0.31
LMNA P02545 1/20 0.30
ALOX12 P18054 1/20 0.30
ACHE P22303 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL780943 0.78 TAAR1 (0.39) TSHRTAAR1CYP2D6TDP1AOC3
SCHEMBL379621 0.78 TSHR (0.41) TSHRTDP1
SCHEMBL28804974 0.78 TSHR (0.41) TSHRTDP1
Water SCHEMBL28841261 0.76 TSHR (0.39) TSHR
SCHEMBL12814847 0.75 ALDH1A1 (0.35) TSHRTAAR1AOC3MAOAMAOB
SCHEMBL24849720 0.74 TAAR1 (0.36) TAAR1TDP1AOC3MAOAMAOB
SCHEMBL28604611 0.74 TAAR1 (0.36) TSHRTAAR1CYP2D6TDP1AOC3
SCHEMBL7363533 0.74 TAAR1 (0.36) TAAR1TDP1AOC3MAOAMAOB
SCHEMBL10318390 0.73 TRPA1 (0.36) TSHRTAAR1CYP2D6AOC3MAOA
SCHEMBL2102290 0.73 TAAR1 (0.34) TSHRTAAR1CYP2D6TDP1SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103003367-B Curable resin composition and cured article DAICEL CORP. (JP) 2015-09-30 CN disclosed
CN-103154145-B Curable resin composition and cured article DAICEL CORP. (JP) 2015-09-16 CN disclosed
CN-103154145-A Curable resin composition and cured article DAICEL CORP 2013-06-12 CN disclosed
CN-103003367-A Curable resin composition and cured product DAICEL CORP 2013-03-27 CN disclosed
US-8129087-B2 Block copolymer and substrate processing method CANON KABUSHIKI KAISHA (JP) 2012-03-06 US disclosed
US-7901866-B2 Pattern forming method CANON KABUSHIKI KAISHA (JP) 2011-03-08 US disclosed
US-20090311633-A1 PATTERN FORMING METHOD CANON KABUSHIKI KAISHA (JP) 2009-12-17 US disclosed
US-20090311637-A1 BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD CANON KABUSHIKI KAISHA (JP) 2009-12-17 US disclosed
WO-2008047817-A1 PATTERN FORMING METHOD CANON KABUSHIKI KAISHA (JP) 2008-04-24 WO disclosed