Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.40 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.40 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.40 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.40 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.40 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.40 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.39 |
| ▸ | TDO2 | P48775 | 1/20 | 0.39 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14228218 | 0.85 | ALDH1A1 (0.45) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL68857 | 0.83 | ALDH1A1 (0.43) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL20476793 | 0.83 | IDO1 (0.41) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL68734 | 0.83 | MAPT (0.41) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL4146537 | 0.83 | PNMT (0.53) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL670917 | 0.81 | TSHR (0.58) | TSHRALDH1A1MAPK1TDP1GRIN2D | |
| SCHEMBL5604297 | 0.81 | TSHR (0.69) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL22394589 | 0.80 | HSP90AA1 (0.40) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL11158851 | 0.80 | USP7 (0.41) | TSHRALDH1A1MAPTMAPK1L3MBTL1 | |
| SCHEMBL20560654 | 0.79 | ALDH1A1 (0.52) | TSHRALDH1A1MAPTMAPK1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1865379-B1 | Method for resist pattern formation, and process for device prodution | CANON KK (JP) | 2013-01-16 | — | — | EP | disclosed |
| CN-101086618-B | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production | CANON KK | 2012-06-20 | — | — | CN | disclosed |
| US-8129087-B2 | Block copolymer and substrate processing method | CANON KABUSHIKI KAISHA (JP) | 2012-03-06 | — | — | US | disclosed |
| US-7651834-B2 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production | CANON KABUSHIKI KAISHA (JP) | 2010-01-26 | — | — | US | disclosed |
| US-20090311637-A1 | BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD | CANON KABUSHIKI KAISHA (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20070287105-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION | CANON KABUSHIKI KAISHA (JP) | 2007-12-13 | — | — | US | disclosed |
| EP-1865379-A1 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution | Canon Kabushiki Kaisha (JP) | 2007-12-12 | — | — | EP | disclosed |
| CN-101086618-A | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production | CANON KK (JP) | 2007-12-12 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070287105-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION | RER1, C1R, CRY2 | TSHR 1221/4885ALDH1A1 2569/4885MAPT 2153/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.