SCHEMBL6911940

SCHEMBL6911940

Cc1ccccc1[S+]([O-])Cc1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
HTR2B P41595 1/20 0.36
MAPK14 Q16539 1/20 0.36
KMT2A Q03164 1/20 0.35
TSHR P16473 2/20 0.35
ACHE P22303 1/20 0.35
TP53 P04637 1/20 0.34
ERCC5 P28715 1/20 0.34
FEN1 P39748 1/20 0.34
SMN1; SMN2 Q16637 4/20 0.34
HPGD P15428 3/20 0.34
HTT P42858 2/20 0.34
KDM4E B2RXH2 1/20 0.34
MAPK1 P28482 1/20 0.33
GAA P10253 1/20 0.33
GPR52 Q9Y2T5 1/20 0.33
CALM1 P0DP23 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8933406 0.83 LTA4H (0.44) TP53SMN1; SMN2HPGDHTTKDM4E
SCHEMBL7063606 0.81 MCHR1 (0.36) SMN1; SMN2HPGDGPR52ALDH1A1LMNA
SCHEMBL6319962 0.78 ACHE (0.36) TSHRACHETP53HTTALDH1A1
SCHEMBL28462452 0.78 CYP2C9 (0.36) CYP2C9CYP2C19HTR2BMAPK14TSHR
SCHEMBL3882276 0.77 ACHE (0.39) TSHRACHEHTTALDH1A1
SCHEMBL6913330 0.77 TP53 (0.31) TP53
SCHEMBL10848584 0.76 POLB (0.38) TSHRTP53SMN1; SMN2HPGDKDM4E
SCHEMBL29285346 0.76 CA12 (0.41) CYP2C9CYP2C19MAPK14KMT2AACHE
SCHEMBL7833396 0.73 ALDH1A1 (0.46) CYP2C9KMT2ATSHRSMN1; SMN2HPGD
SCHEMBL28471973 0.73 NR4A1 (0.37) TSHRTP53HPGDKDM4EGPR52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109485587-B Method for preparing sulfoxide compound by one-step reaction of benzyl chloride compound and thiophenol under metal-free condition 陕西师范大学 2020-10-16 CN disclosed
US-6727294-B2 RADIATION TRANSPARENT MOLDING MATERIALS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2004-04-27 US disclosed
EP-0794218-B1 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENG PLASTICS CORP (JP) 2003-10-15 EP disclosed
EP-0753540-B1 Polycarbonate resin composition MITSUBISHI ENG PLASTICS CORP (JP) 2003-06-11 EP disclosed
US-6359028-B1 USED IN MEDICAL EQUIPMENT, DISCOLORATION INHIBITION MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2002-03-19 US disclosed
US-20010034419-A1 Radiation transparent molding materials MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2001-10-25 US disclosed
US-6040367-A EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2000-03-21 US disclosed
US-5977206-A Polycarbonate resin composition MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) 1999-11-02 US disclosed
US-5948838-A 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) 1999-09-07 US disclosed
EP-0794218-A2 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 1997-09-10 EP disclosed
EP-0753540-A2 Polycarbonate resin composition MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 1997-01-15 EP disclosed