Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 6/20 | 0.40 |
| ▸ | MEN1 | O00255 | 5/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | EGFR | P00533 | 1/20 | 0.37 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | PTGES2 | Q9H7Z7 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | BRAF | P15056 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6549890 | 0.81 | CA2 (0.52) | KMT2AKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL7757515 | 0.71 | CA1 (0.46) | KMT2AKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL6932936 | 0.71 | ALDH1A1 (0.45) | KMT2AKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL1645091 | 0.71 | CA1 (0.60) | KMT2AMEN1KDM4EL3MBTL1ALDH1A1 | |
| SCHEMBL496749 | 0.71 | MEN1 (0.48) | KMT2AMEN1KDM4EL3MBTL1ALDH1A1 | |
| SCHEMBL547494 | 0.71 | ALDH1A1 (0.48) | KMT2AMEN1KDM4EALDH1A1HPGD | |
| SCHEMBL1194611 | 0.71 | KMT2A (0.52) | KMT2AMEN1KDM4EL3MBTL1ALDH1A1 | |
| SCHEMBL28917421 | 0.70 | L3MBTL1 (0.42) | KMT2AMEN1KDM4EL3MBTL1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL28259963 | 0.70 | MEN1 (0.47) | KMT2AMEN1KDM4EL3MBTL1ALDH1A1 | |
| SCHEMBL9162919 | 0.69 | KMT2A (0.50) | KMT2AMEN1KDM4EL3MBTL1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6589705-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-6555289-B2 | Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-29 | — | — | US | disclosed |
| US-6528229-B2 | Mixture of polymer and acid generators | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6506535-B1 | A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020048720-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20010041303-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1096319-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-0417557-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| US-5338641-A | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-16 | — | — | US | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417557-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |