Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3804440 | 0.86 | TRPA1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL2582842 | 0.77 | CYP3A4 (0.33) | ALDH1A1 | |
| SCHEMBL7084375 | 0.77 | GABRA1 (0.42) | ALDH1A1TSHR | |
| SCHEMBL21409719 | 0.77 | ALDH1A1 (0.38) | ALDH1A1TSHR | |
| SCHEMBL8519698 | 0.74 | ALDH1A1 (0.32) | ALDH1A1TSHR | |
| SCHEMBL10792318 | 0.73 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL1052816 | 0.71 | TSHR (0.46) | ALDH1A1TSHR | |
| SCHEMBL5141462 | 0.71 | ALDH1A1 (0.43) | ALDH1A1TSHR | |
| SCHEMBL526123 | 0.71 | ALDH1A1 (0.48) | ALDH1A1TSHR | |
| SCHEMBL2944385 | 0.70 | ALDH1A1 (0.46) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1223902-C | chemically amplified resist and a resist composition | DONGJIN SEMICHEM CO LTD (KR) | 2005-10-19 | — | — | CN | disclosed |
| CN-1162753-C | Chemically amplified resist polymer and resist composition using the same | 东进瑟弥侃株式会社 | 2004-08-18 | — | — | CN | disclosed |
| US-6767687-B1 | CAN FORM FINER PATTERNS ON A SUBSTRATE IN A MICRO-LITHOGRAPHY PROCESS SUITABLE FOR MICRO-PROCESSING OF SEMICONDUCTORS | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-07-27 | — | — | US | disclosed |
| US-6743881-B2 | HIGH RESOLUTION MICROLITHOGRAPHY; POST EXPOSURE DELAY STABILITY; HEAT RESISTANCE; TERPOLYMER CONTAINING STYRENIC, P-VINYLPHENOL AND VINYLBENZENE CONTAINING BRANCHED ESTER SUBSTITUTION | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-06-01 | — | — | US | disclosed |
| US-20030181629-A1 | Chemically amplified resist and a resist composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-09-25 | — | — | US | disclosed |
| CN-1423760-A | Chemically amplified resist and a resist composition | DONGJIN SEMICHEM CO LTD (KR) | 2003-06-11 | — | — | CN | disclosed |
| CN-1378661-A | Polymer for chemically amplified resist and resist composition using same | DONGJIN SEMICHEM CO LTD (KR) | 2002-11-06 | — | — | CN | disclosed |
| WO-2001079934-A1 | CHEMICALLY AMPLIFIED RESIST AND A RESIST COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2001-10-25 | — | — | WO | disclosed |
| WO-2001018603-A2 | POLYMER FOR CHEMICALLY AMPLIFIED RESIST AND A RESIST COMPOSITION USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2001-03-15 | — | — | WO | disclosed |