SCHEMBL701445

SCHEMBL701445

COC(=O)C(C)=CC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.36
ALDH1A1 P00352 1/20 0.35
HSD11B1 P28845 2/20 0.35
CNR1 P21554 2/20 0.34
CNR2 P34972 2/20 0.34
ABL1 P00519 1/20 0.34
TSHR P16473 1/20 0.34
RIN1 Q13671 1/20 0.34
KDM4E B2RXH2 1/20 0.33
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
RAB9A P51151 1/20 0.33
MDM2 Q00987 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
DPP4 P27487 1/20 0.32
EPHX1 P07099 1/20 0.32
GLA P06280 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL27837021 0.92 ALDH1A1 (0.32) PKMALDH1A1HSD11B1CNR1CNR2
SCHEMBL701269 0.88
SCHEMBL7125894 0.85 GLA (0.40) ALDH1A1CNR2TSHREPHX1GLA
SCHEMBL702221 0.85 GLA (0.40) ALDH1A1CNR2TSHREPHX1GLA
SCHEMBL906381 0.84 PKM (0.38) PKMALDH1A1HSD11B1NPC1RAB9A
SCHEMBL565526 0.84 PKM (0.38) PKMALDH1A1HSD11B1NPC1RAB9A
SCHEMBL29082659 0.76
SCHEMBL6905424 0.76
SCHEMBL30898007 0.76
SCHEMBL11091807 0.74 PKM (0.47) PKMALDH1A1HSD11B1CNR2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103772252-A Novel onium salt compound, acid amplifier derived therefrom, and resist composition comprising same KOREA KUMHO PETROCHEM CO LTD 2014-05-07 CN disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed