⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL5355469 | 0.86 | PKM (0.34) | — | |
| SCHEMBL15281467 | 0.85 | PKM (0.37) | — | |
| SCHEMBL41045 | 0.85 | PKM (0.37) | — | |
| SCHEMBL13383446 | 0.85 | PKM (0.37) | — | |
| SCHEMBL30385819 | 0.84 | NAAA (0.32) | — | |
| SCHEMBL565526 | 0.83 | PKM (0.38) | — | |
| SCHEMBL906381 | 0.83 | PKM (0.38) | — | |
| Acrylic Acid SCHEMBL28227378 | 0.83 | PKM (0.32) | — | |
| SCHEMBL13649563 | 0.80 | PKM (0.33) | — | |
| SCHEMBL737596 | 0.76 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024128647-A1 | POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING SAME | 주식회사 동진쎄미켐 | 2024-06-20 | — | — | WO | disclosed |