SCHEMBL702494

SCHEMBL702494

CC(c1ccccc1)(c1ccccc1)c1ccccc1O[SiH3]

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.41
ESR2 Q92731 3/20 0.41
MAPK1 P28482 1/20 0.40
ALDH1A1 P00352 5/20 0.38
ALOX15 P16050 1/20 0.38
TAAR1 Q96RJ0 1/20 0.33
ATM Q13315 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP2B6 P20813 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
HSD17B10 Q99714 1/20 0.33
CYP3A4 P08684 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
SGMS2 Q8NHU3 1/20 0.32
HTR6 P50406 1/20 0.32
MAPT P10636 1/20 0.31
KMT2A Q03164 1/20 0.31
KCNN4 O15554 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8784001 0.82 CA1 (0.48) ESR1ESR2MAPK1ALDH1A1ALOX15
SCHEMBL705017 0.79 ALDH1A1 (0.44) ALDH1A1ALOX15ATMTDP1CYP1A2
SCHEMBL8785032 0.78 CA1 (0.48) ESR1ESR2MAPK1ALDH1A1ALOX15
SCHEMBL705339 0.76 KCNN4 (0.33) MAPK1ALDH1A1ALOX15TAAR1KCNN4
SCHEMBL11004707 0.74 PTGS2 (0.51) ESR1ESR2MAPK1ALDH1A1ATM
SCHEMBL27926604 0.72 NFE2L2 (0.44) ESR1ESR2HTR6KMT2AGAA
SCHEMBL10569877 0.70 KCNH2 (0.37) MAPK1ALDH1A1TDP1HSD17B10KDM4E
SCHEMBL3400019 0.70 ESR1 (0.48) ESR1ESR2MAPK1ALDH1A1ALOX15
SCHEMBL1053934 0.70 PPARG (0.41) ALDH1A1TDP1GAA
SCHEMBL7591055 0.70 ESR1 (0.33) ESR1ESR2MAPK1ALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed