Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP8 | P22894 | 6/20 | 0.69 |
| ▸ | MMP13 | P45452 | 5/20 | 0.69 |
| ▸ | MMP1 | P03956 | 2/20 | 0.43 |
| ▸ | MMP3 | P08254 | 2/20 | 0.43 |
| ▸ | HTR2A | P28223 | 3/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.40 |
| ▸ | HTR2C | P28335 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | NAMPT | P43490 | 1/20 | 0.38 |
| ▸ | PIK3C3 | Q8NEB9 | 1/20 | 0.37 |
| ▸ | DDIT3 | P35638 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL776895 | 0.84 | MAPT (0.55) | MMP8MMP13MMP1HTR2AMAPT | |
| SCHEMBL10797750 | 0.82 | MMP8 (0.60) | MMP8MMP13MMP1MMP3KMT2A | |
| SCHEMBL7212033 | 0.82 | MMP13 (0.71) | MMP8MMP13MMP1MMP3HTR2A | |
| SCHEMBL7212111 | 0.82 | MMP13 (1.00) | MMP8MMP13MMP1MMP3HTR2A | |
| SCHEMBL777971 | 0.82 | MAPT (0.56) | MMP8MMP13MMP1HTR2AMAPT | |
| Hydrochloric Acid SCHEMBL10798125 | 0.81 | MMP8 (0.59) | MMP8MMP13MMP1MMP3KMT2A | |
| SCHEMBL25432674 | 0.81 | ALDH1A1 (0.47) | MMP8MMP13MMP1MMP3HTR2A | |
| Diphenylsulfane SCHEMBL4999406 | 0.78 | MMP8 (0.46) | MMP8MMP13MMP1MEN1KMT2A | |
| SCHEMBL21795337 | 0.78 | MMP8 (0.44) | MMP8MMP13MMP1HTR2AMAPT | |
| SCHEMBL21615770 | 0.78 | HTR2A (0.46) | MMP8MMP13MMP1HTR2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10423083-B2 | Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate | JSR CORPORATION (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-3205640-B1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-05-22 | — | — | EP | disclosed |
| EP-2325695-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| EP-3205640-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-08-16 | — | — | EP | disclosed |
| US-20170176878-A1 | CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE | JSR CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-9459532-B2 | Radiation-sensitive resin composition, polymer and compound | JSR CORPORATION (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9259668-B2 | Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate | JSR CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20140363773-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-20100323292-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100248167-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203452-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100190104-A1 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20090305161-A1 | LIQUID IMMERSION LITHOGRAPHY | JSR CORPORATION (JP) | 2009-12-10 | — | — | US | disclosed |
| EP-2128706-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR Corporation (JP) | 2009-12-02 | — | — | EP | disclosed |
| EP-1953595-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |