Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.42 |
| ▸ | IDO1 | P14902 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL708791 | 0.95 | IDO1 (0.47) | KCNH2SIGMAR1IDO1 | |
| SCHEMBL706398 | 0.92 | SIGMAR1 (0.44) | KCNH2SIGMAR1IDO1L3MBTL1TDP1 | |
| SCHEMBL3481959 | 0.90 | IDO1 (0.42) | KCNH2SIGMAR1IDO1L3MBTL1 | |
| SCHEMBL705824 | 0.90 | SIGMAR1 (0.43) | KCNH2SIGMAR1IDO1TDP1 | |
| SCHEMBL3482224 | 0.89 | IDO1 (0.44) | KCNH2SIGMAR1IDO1 | |
| SCHEMBL708505 | 0.86 | IDO1 (0.48) | KCNH2SIGMAR1IDO1L3MBTL1 | |
| SCHEMBL3481662 | 0.85 | KCNH2 (0.42) | KCNH2SIGMAR1IDO1L3MBTL1 | |
| SCHEMBL706330 | 0.84 | IDO1 (0.46) | KCNH2SIGMAR1IDO1L3MBTL1TDP1 | |
| SCHEMBL3481843 | 0.83 | SIGMAR1 (0.41) | KCNH2SIGMAR1IDO1 | |
| SCHEMBL3482262 | 0.80 | IDO1 (0.46) | KCNH2SIGMAR1IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |