Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | LTA4H | P09960 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19809422 | 0.94 | TP53 (0.37) | TP53LMNAMEN1KMT2ATSHR | |
| SCHEMBL28994595 | 0.91 | MEN1 (0.36) | TP53LMNAMEN1KMT2ATSHR | |
| SCHEMBL19809244 | 0.90 | TP53 (0.37) | TP53LMNAMEN1KMT2ATSHR | |
| SCHEMBL708762 | 0.88 | LTA4H (0.44) | TP53LMNAMEN1KMT2ATSHR | |
| SCHEMBL20658013 | 0.87 | TP53 (0.34) | TP53LMNAMEN1KMT2ANPC1 | |
| SCHEMBL2874013 | 0.86 | LTA4H (0.44) | TP53LMNAMEN1KMT2ATSHR | |
| SCHEMBL3481806 | 0.83 | TP53 (0.41) | TP53LMNAMEN1KMT2ATSHR | |
| SCHEMBL123780 | 0.83 | TP53 (0.44) | TP53LMNATSHRALDH1A1LTA4H | |
| SCHEMBL28994597 | 0.82 | SIGMAR1 (0.32) | TP53SIGMAR1 | |
| SCHEMBL3482143 | 0.82 | AGXT (0.38) | LMNAALDH1A1HPGDTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4141926-A | Method for preparing epoxy-modified silicon resins | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1979-02-27 | — | — | US | claimed |
| WO-2026104032-A1 | SILICONE-BASED RESIN COMPOSITION AND METHOD OF PREPARING THE SAME | WACKER CHEMIE AG (DE) | 2026-05-21 | — | — | WO | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| WO-2000058095-A1 | DIRECT DRAWING PLANOGRAPHIC PRINTING PLATE AND PREPARATION METHOD THEREFOR | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2000-10-05 | — | — | WO | disclosed |
| EP-0987317-A1 | METHOD FOR SURFACE PRETREATMENT BEFORE FORMATION OF PHOTOCATALYTIC HYDROPHILIC FILM, AND DETERGENT AND UNDERCOAT COMPOSITION FOR USE IN THE SAME | TOTO LTD. (JP) | 2000-03-22 | — | — | EP | disclosed |
| US-5939194-A | SEMICONDUCTORS; PHOTOEXCITATION | TOTO LTD. (JP) | 1999-08-17 | — | — | US | disclosed |
| EP-0913447-A1 | PHOTOCATALYTIC HYDROPHILIC COATING COMPOSITION | TOTO LTD. (JP) | 1999-05-06 | — | — | EP | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |
| EP-0700951-A1 | Polyorganosiloxane and process for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1996-03-13 | — | — | EP | disclosed |
| US-5491203-A | COMPRISES POLYSILSESQUIOXANE STRUCTURE; HAS METHYL GROUP AND A REACTIVE GROUP ON SIDE CHAINS; SUITABLE AS POLYMER MODIFIER; CROSSLINKING; COATINGS | SHOWA DENKO K. K. (JP) | 1996-02-13 | — | — | US | disclosed |
| US-4874728-A | DISPERSIBILITY | UNITED CATALYST INC. (US) | 1989-10-17 | — | — | US | disclosed |
| US-4469409-A | Homogeneous alignment layer for liquid crystal display device | HITACHI, LTD. (JP) | 1984-09-04 | — | — | US | disclosed |
| US-4141926-A | Method for preparing epoxy-modified silicon resins | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1979-02-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | TP53 2101/4885LMNA 474/4885MEN1 2480/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | TP53 4706/4885LMNA 625/4885MEN1 1625/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.