Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.41 |
| ▸ | RXRA | P19793 | 1/20 | 0.41 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.41 |
| ▸ | RXRB | P28702 | 1/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.41 |
| ▸ | RXRG | P48443 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2337798 | 1.00 | ALDH1A1 (0.41) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL15753005 | 0.90 | ALDH1A1 (0.39) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL821141 | 0.88 | ALDH1A1 (0.38) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL30578996 | 0.84 | KDM4E (0.39) | ALDH1A1TSHRTDP1MAPK1POLB | |
| SCHEMBL11128788 | 0.81 | MAPK1 (0.31) | MAPK1POLB | |
| SCHEMBL23480562 | 0.78 | MEN1 (0.33) | ALDH1A1MAPK1 | |
| SCHEMBL700169 | 0.72 | CYP1A2 (0.36) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL8078394 | 0.72 | — | — | |
| SCHEMBL28226590 | 0.70 | MAPK1 (0.33) | MAPK1POLB | |
| SCHEMBL701236 | 0.70 | KDM4E (0.38) | ALDH1A1GABRA1TSHRGABRG2RXRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022258030-A1 | COMPOSITION FOR 3D PRINTING, AND 3D PRINTING METHOD AND DEVICE | 珠海赛纳三维科技有限公司 | 2022-12-15 | — | — | WO | claimed |
| CN-113388075-A | Composition for 3D printing, 3D printing method and device | 珠海赛纳三维科技有限公司 | 2021-09-14 | — | — | CN | claimed |
| EP-2929397-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-03-18 | — | — | EP | claimed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | claimed |
| US-20260010071-A1 | SULFONIUM SALT, ACID DIFFUSION INHIBITOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| US-20260008749-A1 | SULFONIUM SALT, ACID DIFFUSION INHIBITOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| CN-118240132-A | Post-treatment method and application of photoresist resin | 徐州博康信息化学品有限公司 | 2024-06-25 | — | — | CN | disclosed |
| EP-4372030-A1 | CURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2024-05-22 | — | — | EP | disclosed |
| EP-4372021-A1 | CURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2024-05-22 | — | — | EP | disclosed |
| WO-2024089906-A1 | RESIN COMPOSITION, ADHESIVE, SEALANT, CURED PRODUCT AND SEMICONDUCTOR DEVICE | NAMICS CORPORATION (JP) | 2024-05-02 | — | — | WO | disclosed |
| WO-2024089905-A1 | RESIN COMPOSITION, ADHESIVE, SEALANT, CURED PRODUCT, SEMICONDUCTOR DEVICE AND ELECTRONIC COMPONENT | NAMICS CORPORATION (JP) | 2024-05-02 | — | — | WO | disclosed |
| CN-111522198-B | Resist composition and pattern forming method | 信越化学工业株式会社 | 2024-01-26 | — | — | CN | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203447-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100068647-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260010071-A1 | SULFONIUM SALT, ACID DIFFUSION INHIBITOR, RESIST COMPOSITION, AND PATTERNING PROCESS | LBR, CA2, GLRA1 | ALDH1A1 4045/4885GABRA1 791/4885TSHR 995/4885 |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | ALDH1A1 3298/4885GABRA1 1830/4885TSHR 1006/4885 |
| US-20260008749-A1 | SULFONIUM SALT, ACID DIFFUSION INHIBITOR, RESIST COMPOSITION, AND PATTERNING PROCESS | LBR, CA2, SLC6A9 | ALDH1A1 4099/4885GABRA1 951/4885TSHR 937/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.