Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.41 |
| ▸ | RXRA | P19793 | 1/20 | 0.41 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.41 |
| ▸ | RXRB | P28702 | 1/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.41 |
| ▸ | RXRG | P48443 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703230 | 1.00 | ALDH1A1 (0.41) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL15753005 | 0.90 | ALDH1A1 (0.39) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL821141 | 0.88 | ALDH1A1 (0.38) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL30578996 | 0.84 | KDM4E (0.39) | ALDH1A1TSHRTDP1MAPK1POLB | |
| SCHEMBL11128788 | 0.81 | MAPK1 (0.31) | MAPK1POLB | |
| SCHEMBL23480562 | 0.78 | MEN1 (0.33) | ALDH1A1MAPK1 | |
| SCHEMBL700169 | 0.72 | CYP1A2 (0.36) | ALDH1A1GABRA1TSHRGABRG2RXRA | |
| SCHEMBL8078394 | 0.72 | — | — | |
| SCHEMBL28226590 | 0.70 | MAPK1 (0.33) | MAPK1POLB | |
| SCHEMBL701236 | 0.70 | KDM4E (0.38) | ALDH1A1GABRA1TSHRGABRG2RXRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022258030-A1 | COMPOSITION FOR 3D PRINTING, AND 3D PRINTING METHOD AND DEVICE | 珠海赛纳三维科技有限公司 | 2022-12-15 | — | — | WO | claimed |
| CN-113388075-B | Composition for 3D printing, 3D printing method and device | 珠海赛纳三维科技有限公司 | 2023-03-24 | — | — | CN | disclosed |
| EP-2524914-B1 | SULFONIC ACID DERIVATIVE COMPOUND AND NAPHTHALIC ACID DERIVATIVE COMPOUND | ADEKA CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| US-10248020-B2 | Acid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-04-02 | — | — | US | disclosed |
| US-9422445-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-08-23 | — | — | US | disclosed |
| US-20160053129-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | CENTRAL GLASS CO., LTD. (JP) | 2016-02-25 | — | — | US | disclosed |
| US-9223217-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-12-29 | — | — | US | disclosed |
| US-9156785-B2 | Base reactive photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-10-13 | — | — | US | disclosed |
| US-20140186767-A1 | ACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-07-03 | — | — | US | disclosed |
| US-8680268-B2 | Sulfonic acid derivative compound and novel naphthalic acid derivative compound | ADEKA CORPORATION (JP) | 2014-03-25 | — | — | US | disclosed |
| EP-2524914-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND | Adeka Corporation (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120289697-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND | ADEKA CORPORATION (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| US-20110207051-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120289697-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND | TPD52L2, TST, SULT1A1 | ALDH1A1 503/4885GABRA1 1933/4885TSHR 3266/4885 |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ALAD, APEX1, HMBS | ALDH1A1 1611/4885GABRA1 651/4885TSHR 3784/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.