SCHEMBL703317

SCHEMBL703317

F[Si](F)Cc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 1/20 0.45
TSHR P16473 4/20 0.41
ALDH1A1 P00352 3/20 0.41
IDO1 P14902 3/20 0.41
LOXL2 Q9Y4K0 2/20 0.41
TP53 P04637 1/20 0.41
TRPA1 O75762 1/20 0.41
MAOB P27338 1/20 0.39
HPGD P15428 1/20 0.39
ALOX15 P16050 1/20 0.39
ALOX12 P18054 1/20 0.39
CASP1 P29466 1/20 0.39
HSD17B10 Q99714 1/20 0.39
FAAH O00519 1/20 0.39
PRSS1 P07477 1/20 0.39
PRSS2 P07478 1/20 0.39
ELANE P08246 1/20 0.39
PRTN3 P24158 1/20 0.39
PRSS3 P35030 1/20 0.39
TDP1 Q9NUW8 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703494 0.82 CALM1 (0.45) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL41195 0.75 CALM1 (0.50) CALM1TSHRALDH1A1IDO1LOXL2
Fluoride SCHEMBL27669420 0.73 CALM1 (0.47) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL9075638 0.72 TP53 (0.50) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL6960730 0.71 TP53 (0.48) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL476127 0.71 PTGS1 (0.48) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL8992232 0.69 CALM1 (0.43) CALM1TSHRALDH1A1IDO1LOXL2
Fluoride SCHEMBL28075258 0.69 PTGS1 (0.47) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL8992221 0.69 CALM1 (0.43) CALM1TSHRALDH1A1IDO1LOXL2
SCHEMBL8575145 0.67 TP53 (0.50) CALM1TSHRALDH1A1IDO1LOXL2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107428891-B Curable composition 施敏打硬株式会社 2021-04-20 CN disclosed
CN-105392845-B Photocurable composition 思美定株式会社 2020-10-20 CN disclosed
EP-3081612-B1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES CEMEDINE CO LTD (JP) 2018-11-14 EP disclosed
US-9718999-B2 Photocurable composition having adhesive properties CEMEDINE CO., LTD (JP) 2017-08-01 US disclosed
US-20160312089-A1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES CEMEDINE CO., LTD. (JP) 2016-10-27 US disclosed
EP-3081612-A1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES Cemedine Co., Ltd. (JP) 2016-10-19 EP disclosed
US-20160152783-A1 PHOTOCURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2016-06-02 US disclosed
EP-3023462-A1 PHOTOCURABLE COMPOSITION Cemedine Co., Ltd. (JP) 2016-05-25 EP disclosed
CN-105392845-A Photocurable composition CEMEDINE CO LTD 2016-03-09 CN disclosed
US-8124690-B2 Moisture curable polymer having SiF group, and curable composition containing the same KANEKA CORPORATION (JP) 2012-02-28 US disclosed
US-20090275702-A1 MOISTURE CURABLE POLYMER HAVING SiF GROUP, AND CURABLE COMPOSITION CONTAINING THE SAME KANEKA CORPORATION (JP) 2009-11-05 US disclosed
EP-2062929-A1 MOISTURE-CURABLE POLYMER HAVING SiF GROUP AND CURABLE COMPOSITION CONTAINING THE SAME Kaneka Corporation (JP) 2009-05-27 EP disclosed