Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNA3 | P22001 | 1/20 | 0.37 |
| ▸ | CA4 | P22748 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.34 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.34 |
| ▸ | LTA4H | P09960 | 3/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.33 |
| ▸ | HTR1B | P28222 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL702432 | 0.96 | KCNH2 (0.38) | KCNA3CA4KCNH2RIPK1LTA4H | |
| SCHEMBL704045 | 0.92 | CA4 (0.37) | KCNA3CA4KCNH2RIPK1LTA4H | |
| SCHEMBL707620 | 0.83 | CA4 (0.37) | KCNA3CA4KCNH2RIPK1LTA4H | |
| SCHEMBL705258 | 0.80 | KCNA3 (0.37) | KCNA3CA4RIPK1LTA4HHTR1B | |
| SCHEMBL705358 | 0.76 | KCNA3 (0.37) | KCNA3CA4KCNH2RIPK1LTA4H | |
| SCHEMBL706731 | 0.75 | CA4 (0.37) | KCNA3CA4KCNH2RIPK1LTA4H | |
| SCHEMBL429409 | 0.73 | CA4 (0.43) | KCNA3CA4KCNH2RIPK1LTA4H | |
| SCHEMBL704371 | 0.72 | KCNA3 (0.41) | KCNA3CA4KCNH2LTA4HHTR1B | |
| SCHEMBL703963 | 0.72 | KCNA3 (0.41) | KCNA3CA4KCNH2LTA4HHTR1B | |
| SCHEMBL426731 | 0.72 | CA4 (0.42) | KCNA3CA4KCNH2RIPK1LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |