Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | RIPK1 | Q13546 | 2/20 | 0.39 |
| ▸ | CACNA1F | O60840 | 1/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.37 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.37 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.37 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.37 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.37 |
| ▸ | HRH1 | P35367 | 1/20 | 0.37 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.37 |
| ▸ | CACNA1D | Q01668 | 1/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.37 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
| ▸ | CACNA1S | Q13698 | 1/20 | 0.37 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.37 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.34 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28372401 | 0.82 | SLC6A4 (0.44) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL3481706 | 0.81 | CHRNA7 (0.35) | — | |
| SCHEMBL1911313 | 0.80 | SLC6A4 (0.42) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL15087920 | 0.80 | SLC6A4 (0.42) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL17086696 | 0.80 | SLC6A4 (0.42) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL53374 | 0.80 | TAAR1 (0.37) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL705569 | 0.79 | RIPK1 (0.37) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL8954028 | 0.79 | ALDH1A1 (0.34) | HIF1AL3MBTL1MAPK1ALDH1A1 | |
| SCHEMBL2330105 | 0.78 | SLC6A4 (0.41) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 | |
| SCHEMBL19121443 | 0.78 | SLC6A4 (0.41) | SLC6A4RIPK1CACNA1FCHRM2CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0324585-B1 | CATALYST COMPOSITION FOR PREPARING HIGH DENSITY OR LINEAR LOW DENSITY OLEFIN POLYMERS OF CONTROLLED MOLECULAR WEIGHT DISTRIBUTION | MOBIL OIL CORPORATION (US) | 1993-05-05 | — | — | EP | claimed |
| CN-116355270-A | Rigid nano-pore organic silicon aerogel and preparation method and application thereof | 华东理工大学 | 2023-06-30 | — | — | CN | disclosed |
| CN-109943226-B | High-bending-resistance glass coating liquid composition and preparation method thereof | 深圳市航天新材科技有限公司 | 2021-04-13 | — | — | CN | disclosed |
| CN-109836970-B | High-impermeability graphene modified epoxy coating liquid composition and preparation method thereof | 深圳市航天新材科技有限公司 | 2021-01-12 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-8299185-B2 | Curable cage-type silicone copolymer and process for production thereof and curable resin composition comprising curable cage-type silicone copolymer and cured product thereof | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 2012-10-30 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100280190-A1 | CURABLE CAGE-TYPE SILICONE COPOLYMER AND PROCESS FOR PRODUCTION THEREOF AND CURABLE RESIN COMPOSITION COMPRISING CURABLE CAGE-TYPE SILICONE COPOLYMER AND CURED PRODUCT THEREOF | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2010-11-04 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |