Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNA7 | P36544 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 3/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8954028 | 0.82 | ALDH1A1 (0.34) | TSHRACHETDP1 | |
| SCHEMBL704259 | 0.81 | SLC6A4 (0.41) | — | |
| SCHEMBL3481587 | 0.80 | ALDH1A1 (0.46) | TSHRACHETDP1 | |
| SCHEMBL3867727 | 0.76 | TSHR (0.37) | CHRNA7TSHRACHETDP1ALOX5 | |
| SCHEMBL30949389 | 0.75 | CHRNA7 (0.42) | CHRNA7TSHRACHETDP1ALOX5 | |
| SCHEMBL23938690 | 0.75 | TDP1 (0.38) | CHRNA7TSHRACHETDP1ALOX5 | |
| SCHEMBL3482030 | 0.72 | KEAP1 (0.37) | TSHRACHE | |
| SCHEMBL17086707 | 0.71 | ALDH1A1 (0.39) | CHRNA7TSHRACHETDP1ALOX5 | |
| SCHEMBL17086708 | 0.71 | ALDH1A1 (0.39) | CHRNA7TSHRACHETDP1ALOX5 | |
| SCHEMBL20706326 | 0.71 | CHRNA7 (0.39) | CHRNA7TSHRACHETDP1ALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |