SCHEMBL705169

SCHEMBL705169

CCC(O[SiH3])c1ccccc1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.47
SLC6A2 P23975 3/20 0.37
SLC6A4 P31645 3/20 0.37
CYP2D6 P10635 2/20 0.36
SLC6A3 Q01959 2/20 0.36
ADRA2A P08913 2/20 0.36
ADRA2B P18089 2/20 0.36
SLC22A2 O15244 1/20 0.36
SLC22A1 O15245 1/20 0.36
GRIN2D O15399 1/20 0.36
GRIN3B O60391 1/20 0.36
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
CHRM5 P08912 1/20 0.36
CHRM1 P11229 1/20 0.36
CHRM3 P20309 1/20 0.36
DRD1 P21728 1/20 0.36
HRH2 P25021 1/20 0.36
HTR2A P28223 1/20 0.36
HTR2C P28335 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704366 0.86 ADRA2A (0.37) ESR1SLC6A2SLC6A4CYP2D6ADRA2A
SCHEMBL703010 0.85 ESR1 (0.44) ESR1SLC6A2SLC6A4CYP2D6SLC6A3
SCHEMBL8441501 0.82 ESR1 (0.48) ESR1SLC6A2SLC6A4CYP2D6SLC6A3
SCHEMBL715340 0.80 TSHR (0.39) SLC6A2HTR2CCYP2C19HTR2BCYP3A4
SCHEMBL8750626 0.78 ESR1 (0.50) ESR1SLC6A2SLC6A4CYP2D6SLC6A3
SCHEMBL707358 0.78 MAPT (0.38) SLC6A2SLC6A4CYP2D6SLC6A3OPRM1
SCHEMBL27834053 0.77 ESR1 (0.44) ESR1SLC6A2SLC6A4CYP2D6SLC6A3
SCHEMBL3481497 0.76 ADRA2A (0.40) ADRA2AADRA2BTSHRADRA2C
SCHEMBL705123 0.76 TSHR (0.36) CYP2D6CYP2C19CYP3A4CYP2C9TSHR
SCHEMBL15669205 0.76 AOC3 (0.50) SLC6A2SLC6A4ADRA2AADRA2BCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
US-20210238419-A1 SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER JNC CORPORATION (JP) 2021-08-05 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed