Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 4/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | RAB9A | P51151 | 4/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.54 |
| ▸ | TP53 | P04637 | 3/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.54 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | PDE4A | P27815 | 1/20 | 0.49 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | PDE10A | Q9Y233 | 2/20 | 0.43 |
| ▸ | ACACA | Q13085 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | PDE2A | O00408 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29373643 | 0.94 | L3MBTL1 (0.50) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL62627 | 0.94 | L3MBTL1 (0.50) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL28767208 | 0.90 | ALDH1A1 (0.54) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL7897274 | 0.87 | L3MBTL1 (0.53) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL29732925 | 0.87 | L3MBTL1 (0.53) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL16365751 | 0.79 | L3MBTL1 (0.43) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL29895740 | 0.79 | L3MBTL1 (0.43) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL3083486 | 0.78 | L3MBTL1 (0.45) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL31734215 | 0.78 | L3MBTL1 (0.43) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 | |
| SCHEMBL16355181 | 0.78 | L3MBTL1 (0.43) | NPC1ALDH1A1RAB9AL3MBTL1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2976372-B1 | ADHESIVE COMPOSITION BASED ON A POLYESTER URETHANE, AND POLYESTER URETHANE | FRAUNHOFER GES FORSCHUNG (DE) | 2020-06-03 | — | — | EP | claimed |
| EP-1000959-B1 | Polyetherquat functional polysiloxanes | GOLDSCHMIDT AG TH (DE) | 2003-04-16 | — | — | EP | claimed |
| US-6180319-B1 | APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-01-30 | — | — | US | claimed |
| EP-0941866-B1 | Thermally imageable element having improved room light stability | DU PONT (US) | 2003-04-16 | — | — | EP | disclosed |
| EP-0909990-B1 | Photopolymerizable compositions having improved sidewall geometry and development latitude | DU PONT (US) | 2002-10-16 | — | — | EP | disclosed |
| US-6180319-B1 | APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-01-30 | — | — | US | disclosed |
| US-5962190-A | BINDER OF C4-10 ALKYL METHACRYLATE, C4-10 ALKYL ACRYLATE, METHYL METHACRYLATE OR ETHYL METHACRYLATE, METHACRYLIC ACID OR ACRYLIC ACID, AND STYRENE; UNSATURATED CROSSLINKING AGENT; PHOTOINITIATOR; RELIEF IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-10-05 | — | — | US | disclosed |
| EP-0941866-A1 | Non-photosensitive, thermally imageable element having improved room light stability | E. I. du Pont de Nemours and Company (US) | 1999-09-15 | — | — | EP | disclosed |
| EP-0909990-A2 | Photopolymerizable compositions having improved sidewall geometry and development latitude | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-04-21 | — | — | EP | disclosed |