SCHEMBL7897274

SCHEMBL7897274

COc1ccc(-c2nc(-c3ccccc3Cl)n(-n3c(-c4ccccc4Cl)nc(-c4ccccc4)c3-c3ccccc3)c2-c2ccccc2Cl)cc1OC

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.53
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
ALDH1A1 P00352 3/20 0.49
TSHR P16473 2/20 0.49
TP53 P04637 2/20 0.49
NPC1 O15118 1/20 0.49
RAB9A P51151 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
PDE4A P27815 1/20 0.45
ADORA1 P30542 2/20 0.44
ACACA Q13085 1/20 0.44
KDM4E B2RXH2 2/20 0.42
HSD17B10 Q99714 2/20 0.42
ADORA2A P29274 1/20 0.42
MGAM O43451 1/20 0.41
GAA P10253 1/20 0.41
SI P14410 1/20 0.41
MGAM2 Q2M2H8 1/20 0.41
USP2 O75604 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29732925 1.00 L3MBTL1 (0.53) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL28767208 0.94 ALDH1A1 (0.54) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL62627 0.93 L3MBTL1 (0.50) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL29373643 0.93 L3MBTL1 (0.50) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL7044209 0.87 NPC1 (0.54) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL22507470 0.86 L3MBTL1 (0.50) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL3083486 0.82 L3MBTL1 (0.45) L3MBTL1MEN1KMT2AALDH1A1TSHR
SCHEMBL29732755 0.82 HSD11B1 (0.49) ALDH1A1TP53NPC1RAB9ASMN1; SMN2
SCHEMBL63728 0.82 HSD11B1 (0.49) ALDH1A1TP53NPC1RAB9ASMN1; SMN2
SCHEMBL31467390 0.80 L3MBTL1 (0.50) L3MBTL1MEN1KMT2AALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180319-B1 APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-30 US claimed
US-6180319-B1 APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-30 US disclosed