SCHEMBL704670

SCHEMBL704670

c1ccc(CCC[SiH](Oc2ccccc2)Oc2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 1/20 0.44
DRD4 P21917 1/20 0.44
DRD3 P35462 1/20 0.44
IDO1 P14902 1/20 0.44
SIGMAR1 Q99720 3/20 0.42
MAOA P21397 1/20 0.42
MAOB P27338 2/20 0.41
HTR2A P28223 1/20 0.41
NPC1 O15118 1/20 0.40
CASP3 P42574 1/20 0.40
RAB9A P51151 1/20 0.40
SENP8 Q96LD8 1/20 0.40
SENP7 Q9BQF6 1/20 0.40
SENP6 Q9GZR1 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
LTA4H P09960 1/20 0.40
EPHX2 P34913 1/20 0.40
HDAC3 O15379 1/20 0.39
MAPK1 P28482 1/20 0.39
ADRA1A P35348 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706247 0.94 MAOA (0.45) DRD2DRD4DRD3IDO1SIGMAR1
SCHEMBL704612 0.88 ALDH1A1 (0.41) DRD2DRD4DRD3IDO1MAOA
SCHEMBL706800 0.78 LTA4H (0.47) DRD2DRD3MAOAHTR2ALTA4H
SCHEMBL705764 0.78 IDO1 (0.45) DRD3IDO1SIGMAR1MAOAMAOB
SCHEMBL4363258 0.76 KCNA3 (0.37) DRD2DRD4DRD3TDP1LTA4H
SCHEMBL3350917 0.76 HDAC3 (0.52) DRD2DRD4DRD3IDO1LTA4H
SCHEMBL4361022 0.76 KCNA3 (0.41) DRD2DRD4DRD3NPC1RAB9A
SCHEMBL19927175 0.76 LTA4H (0.47) DRD2DRD3MAOAHTR2ALTA4H
SCHEMBL31187726 0.74 LTA4H (0.46) DRD2DRD3MAOAHTR2ALTA4H
SCHEMBL707896 0.74 CHRM2 (0.44) DRD3IDO1SIGMAR1MAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed