SCHEMBL704956

SCHEMBL704956

CC(C)c1ccccc1-c1ccccc1O[SiH3]

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.39
GABRB2 P47870 2/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA12 O43570 1/20 0.39
CA9 Q16790 1/20 0.39
LMNA P02545 4/20 0.36
KMT2A Q03164 2/20 0.36
CYP1A2 P05177 3/20 0.35
CYP3A4 P08684 3/20 0.35
HPGD P15428 2/20 0.35
BLM P54132 2/20 0.35
HIF1A Q16665 2/20 0.35
FAAH O00519 1/20 0.35
TSHR P16473 1/20 0.35
GABRB1 P18505 1/20 0.35
GABRG2 P18507 1/20 0.35
PTGS1 P23219 1/20 0.35
SLC6A2 P23975 1/20 0.35
HTR2C P28335 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL712038 0.85 GABRA1 (0.35) GABRA1GABRB2CA1CA2CA12
SCHEMBL705071 0.83 GABRA1 (0.44) GABRA1GABRB2CA1CA2LMNA
SCHEMBL13232511 0.82 APP (0.48) CA1CA2CA12CA9LMNA
SCHEMBL29414063 0.80 GABRA1 (0.55) GABRA1GABRB2CA1CA2CA12
SCHEMBL167078 0.80 GABRA1 (0.55) GABRA1GABRB2CA1CA2CA12
SCHEMBL9174922 0.78 GABRA1 (0.52) GABRA1GABRB2CA1CA2CA12
SCHEMBL6246384 0.76 LMNA (0.40) GABRA1GABRB2CA1CA2CA12
Hydrogen Peroxide SCHEMBL9644435 0.75 GABRA1 (0.56) GABRA1GABRB2CA1CA2CA12
SCHEMBL28888676 0.74 KMT2A (0.42) GABRA1GABRB2LMNAKMT2ACYP1A2
SCHEMBL21059257 0.73 GABRA1 (0.41) GABRA1GABRB2CA1CA2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109641482-B Preparation of cis-1, 4-polydienes having multiple silane functional groups prepared by in situ hydrosilylation of polymer glues 株式会社普利司通 2021-11-05 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-4831091-A USING A COORDINATION CATALYST CONTAINING A SILANETRIOL OR -DIOL AS WELL AS AN AROMATIC ESTSER; ODORLESS; STEREOSPECIFIC; PARTICLE SIZES CHISSO CORPORATION (JP) 1989-05-16 US disclosed