SCHEMBL705170

SCHEMBL705170

C[SiH2]OCCCc1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.55
LMNA P02545 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
SIGMAR1 Q99720 3/20 0.43
MAOA P21397 1/20 0.43
POLB P06746 1/20 0.43
CHRM2 P08172 1/20 0.42
HTR1A P08908 1/20 0.42
ADRA2A P08913 1/20 0.42
CHRM1 P11229 1/20 0.42
DRD1 P21728 1/20 0.42
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
ADRA1A P35348 1/20 0.42
OPRM1 P35372 1/20 0.42
DRD3 P35462 1/20 0.42
SLC6A3 Q01959 1/20 0.42
KCNH2 Q12809 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703011 0.94 IDO1 (0.48) IDO1L3MBTL1SIGMAR1MAOA
SCHEMBL704523 0.87 CA1 (0.44) IDO1AOC3
SCHEMBL28670784 0.85 MEN1 (0.41) IDO1L3MBTL1MEN1KMT2AKCNH2
SCHEMBL707359 0.80 IDO1 (0.52) IDO1LMNAL3MBTL1MEN1KMT2A
SCHEMBL704446 0.80 IDO1 (0.47) IDO1LMNASIGMAR1CHRM2HTR1A
SCHEMBL10794920 0.79 IDO1 (0.55) IDO1LMNAMEN1KMT2ASIGMAR1
SCHEMBL705124 0.79 IDO1 (0.50) IDO1LMNAL3MBTL1MEN1KMT2A
SCHEMBL715341 0.79 IDO1 (0.50) IDO1LMNASIGMAR1ADRA1ASLC6A3
SCHEMBL1512799 0.79 IDO1 (0.50) IDO1LMNAL3MBTL1MEN1KMT2A
SCHEMBL28693706 0.79 TSHR (0.50) IDO1L3MBTL1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
US-20210238419-A1 SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER JNC CORPORATION (JP) 2021-08-05 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
EP-0385765-B1 Process for polymerizing olefins and catalyst for polymerizing olefins MITSUI PETROCHEMICAL IND (JP) 1995-05-03 EP disclosed
EP-0385765-A2 Process for polymerizing olefins and catalyst for polymerizing olefins MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-09-05 EP disclosed