SCHEMBL7069601

SCHEMBL7069601

Cc1ccccc1/C=C\C(=O)Cl

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
TSHR P16473 2/20 0.48
RAB9A P51151 3/20 0.47
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
LMNA P02545 2/20 0.44
MAPT P10636 2/20 0.44
TRPM8 Q7Z2W7 1/20 0.44
KDM4E B2RXH2 3/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
GMNN O75496 1/20 0.43
PMP22 Q01453 1/20 0.43
NFE2L2 Q16236 2/20 0.42
NFKB1 P19838 2/20 0.42
JUN P05412 1/20 0.42
TFEB P19484 1/20 0.42
CA4 P22748 1/20 0.41
HSD11B1 P28845 1/20 0.41
TP53 P04637 2/20 0.41
CYP1A2 P05177 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6421785 1.00 ALDH1A1 (0.48) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL6421789 1.00 ALDH1A1 (0.48) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL11788928 0.85 PTGER1 (0.41) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL6907589 0.85 NFKB1 (0.50) RAB9ACA1CA2LMNAMAPT
SCHEMBL8815170 0.84 MAPT (0.42) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL5598954 0.83 NFE2L2 (0.61) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL5598952 0.83 NFE2L2 (0.61) ALDH1A1TSHRRAB9ACA1CA2
Hydrochloric Acid SCHEMBL9712404 0.83 CA1 (0.37) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL78556 0.82 CA1 (0.62) ALDH1A1TSHRRAB9ACA1CA2
SCHEMBL14279409 0.82 MAPT (0.66) ALDH1A1TSHRRAB9ACA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed