SCHEMBL707177

SCHEMBL707177

CCc1ccccc1-c1ccccc1O[SiH3]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.43
MAPT P10636 2/20 0.43
NPSR1 Q6W5P4 1/20 0.43
CSNK2A2 P19784 1/20 0.40
CSNK2B P67870 1/20 0.40
CSNK2A1 P68400 1/20 0.40
CSNK2A3 Q8NEV1 1/20 0.40
HPGD P15428 1/20 0.38
ATM Q13315 1/20 0.38
KCNN4 O15554 1/20 0.37
CYP2D6 P10635 1/20 0.37
HTR7 P34969 2/20 0.36
GAA P10253 1/20 0.36
GABRA1 P14867 2/20 0.35
GABRB2 P47870 2/20 0.35
KDM4E B2RXH2 1/20 0.35
DHFR P00374 1/20 0.35
SGMS2 Q8NHU3 1/20 0.35
NISCH Q9Y2I1 1/20 0.34
TRPA1 O75762 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704143 0.85 L3MBTL1 (0.39) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL16933878 0.83 L3MBTL1 (0.46) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B
SCHEMBL707317 0.83 L3MBTL1 (0.53) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL705396 0.82 ALOX5 (0.41) CYP2D6
SCHEMBL198461 0.80 CSNK2A2 (0.52) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B
SCHEMBL28642810 0.79 ADRA2A (0.37) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B
Ethane SCHEMBL3687850 0.78 CSNK2A2 (0.50) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B
SCHEMBL11382359 0.78 CSNK2A2 (0.50) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B
SCHEMBL2776956 0.78 CSNK2A2 (0.50) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B
SCHEMBL28642969 0.77 L3MBTL1 (0.41) L3MBTL1MAPTNPSR1CSNK2A2CSNK2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109641482-B Preparation of cis-1, 4-polydienes having multiple silane functional groups prepared by in situ hydrosilylation of polymer glues 株式会社普利司通 2021-11-05 CN disclosed
CN-109715680-B Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions 株式会社普利司通 2021-10-19 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed