SCHEMBL704143

SCHEMBL704143

CCc1cccc(-c2ccccc2O[SiH3])c1CC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.39
MAPT P10636 2/20 0.39
NPSR1 Q6W5P4 1/20 0.39
GABRA1 P14867 2/20 0.35
GABRB2 P47870 2/20 0.35
HPGD P15428 1/20 0.34
ATM Q13315 1/20 0.34
KDM4E B2RXH2 2/20 0.33
CYP2D6 P10635 1/20 0.33
GAA P10253 1/20 0.33
RECQL P46063 1/20 0.33
PDK2 Q15119 1/20 0.33
PLA2G2A P14555 2/20 0.32
SGMS2 Q8NHU3 1/20 0.32
HTR1A P08908 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32
CTSL P07711 1/20 0.31
CTSS P25774 1/20 0.31
CTSK P43235 1/20 0.31
NISCH Q9Y2I1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL707177 0.85 L3MBTL1 (0.43) L3MBTL1MAPTNPSR1GABRA1GABRB2
SCHEMBL18784869 0.83 GABRA1 (0.41) L3MBTL1MAPTNPSR1GABRA1GABRB2
SCHEMBL4529434 0.81 GABRA1 (0.50) GABRA1GABRB2CYP2D6PDK2HTR1A
SCHEMBL707310 0.80 CTSL (0.38) HPGDKDM4EGAAHTR1ATAAR1
SCHEMBL446045 0.80 L3MBTL1 (0.37) L3MBTL1MAPTNPSR1GABRA1GABRB2
SCHEMBL473257 0.79 GABRA1 (0.44) L3MBTL1MAPTGABRA1GABRB2CYP2D6
SCHEMBL28814510 0.79 PLA2G2A (0.37) L3MBTL1MAPTNPSR1GABRA1GABRB2
SCHEMBL704334 0.78 PTGS2 (0.41) CYP2D6
SCHEMBL446047 0.78 INPPL1 (0.46) L3MBTL1MAPTNPSR1GABRA1GABRB2
SCHEMBL707317 0.77 L3MBTL1 (0.53) L3MBTL1MAPTNPSR1GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed