SCHEMBL7073706

SCHEMBL7073706

CCOc1cc(C(=O)Cl)co1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GLRA1 P23415 1/20 0.38
TSHR P16473 3/20 0.36
LMNA P02545 1/20 0.35
HTT P42858 1/20 0.35
PARP10 Q53GL7 1/20 0.34
CYP3A4 P08684 1/20 0.34
NPC1 O15118 3/20 0.34
THRB P10828 2/20 0.34
RAB9A P51151 2/20 0.34
MAPK1 P28482 2/20 0.34
USP2 O75604 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HSD17B10 Q99714 1/20 0.34
KDM4E B2RXH2 1/20 0.34
MITF O75030 1/20 0.34
CREBBP Q92793 1/20 0.33
MRGPRX4 Q96LA9 1/20 0.33
PLK1 P53350 1/20 0.33
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11400487 0.83 TSHR (0.45) TSHRHTTSMN1; SMN2HSD17B10CREBBP
SCHEMBL7074073 0.81 NR4A2 (0.38) GLRA1TSHRLMNACYP3A4NPC1
SCHEMBL11838296 0.75 FAAH (0.42)
SCHEMBL11838326 0.75 FAAH (0.42)
SCHEMBL11838308 0.75 FAAH (0.42)
SCHEMBL7068607 0.73 L3MBTL1 (0.37) GLRA1TSHRHSD17B10KDM4E
SCHEMBL22800274 0.72
SCHEMBL2567435 0.71 KMT2A (0.46) GLRA1TSHRLMNAPARP10NPC1
SCHEMBL5657660 0.70 ALDH1A1 (0.42) MAPK1KDM4EMRGPRX4POLB
SCHEMBL7073586 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1231816-C Photoresist compositions SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
CN-1230704-A Photoresist compositions SUMITOMO CHEMICAL CO (JP) 1999-10-06 CN disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed
US-3982922-A Herbicidal compositions containing furancarboxamides VELSICOL CHEMICAL CORPORATION (US) 1976-09-28 US disclosed