SCHEMBL7074073

SCHEMBL7074073

COc1cc(C(=O)Cl)co1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A2 P43354 1/20 0.38
RAB9A P51151 3/20 0.34
NPC1 O15118 1/20 0.34
CA2 P00918 3/20 0.33
CES2 O00748 1/20 0.33
CES1 P23141 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
GAA P10253 2/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CA1 P00915 2/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
TSHR P16473 1/20 0.31
CYP2C19 P33261 1/20 0.31
CA12 O43570 1/20 0.31
CA3 P07451 1/20 0.31
PKM P14618 1/20 0.31
CA4 P22748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5154603 0.82 NR4A2 (0.54) NR4A2RAB9ACA2CA1TSHR
SCHEMBL7073706 0.81 GLRA1 (0.38) RAB9ANPC1SMN1; SMN2CYP3A4TSHR
SCHEMBL5657660 0.73 ALDH1A1 (0.42) MEN1KMT2AGAAALDH1A1KDM4E
SCHEMBL7073586 0.72
SCHEMBL9357016 0.70 DAO (0.31) MEN1KMT2ATSHRGLRA1ALDH1A1
SCHEMBL3054665 0.68
SCHEMBL10638678 0.68 CHRNB2 (0.31)
SCHEMBL7068607 0.68 L3MBTL1 (0.37) GAATSHRGLRA1KDM4EHSD17B10
SCHEMBL3361585 0.66 CES2 (0.47) CA2CES2CES1MEN1KMT2A
SCHEMBL24155 0.66 ALDH1A1 (0.52) RAB9ANPC1CES2CES1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1231816-C Photoresist compositions SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
CN-1230704-A Photoresist compositions SUMITOMO CHEMICAL CO (JP) 1999-10-06 CN disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed