Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 1/20 | 0.52 |
| ▸ | MAOB | P27338 | 2/20 | 0.50 |
| ▸ | SIGMAR1 | Q99720 | 10/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.45 |
| ▸ | HTR2A | P28223 | 1/20 | 0.45 |
| ▸ | IGF1R | P08069 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707338 | 0.93 | SIGMAR1 (0.48) | MAOAMAOBSIGMAR1L3MBTL1HTR2A | |
| SCHEMBL702837 | 0.83 | ALDH1A1 (0.48) | MAOAMAOBSIGMAR1L3MBTL1HTR2A | |
| SCHEMBL451456 | 0.80 | MAOA (0.74) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL2803699 | 0.77 | MAOA (0.52) | MAOAMAOBSIGMAR1L3MBTL1 | |
| SCHEMBL10608209 | 0.77 | MAOA (0.52) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL707928 | 0.77 | MAOA (0.52) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL705290 | 0.77 | MAOA (0.52) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL676854 | 0.77 | SIGMAR1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL8094527 | 0.77 | SIGMAR1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL8095284 | 0.77 | SIGMAR1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |